High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates

Silicon ◽  
2015 ◽  
Vol 8 (3) ◽  
pp. 345-350 ◽  
Author(s):  
A. M. Mahajan ◽  
Anil G. Khairnar ◽  
B. J. Thibeault
Keyword(s):  
Dielectric Constant ◽  
Atomic Layer Deposition ◽  
High Dielectric Constant ◽  
Atomic Layer ◽  
Deposition Technique ◽  
Layer Deposition ◽  
High Dielectric ◽  
Atomic Layer Deposition Technique ◽  
Germanium Substrates

Atomic layer deposition of gadolinium scandate films with high dielectric constant and low leakage current

2006 ◽  
Vol 89 (13) ◽  
pp. 133512 ◽  
Author(s):  
Kyoung H. Kim ◽  
Damon B. Farmer ◽  
Jean-Sebastien M. Lehn ◽  
P. Venkateswara Rao ◽  
Roy G. Gordon
Keyword(s):  
Dielectric Constant ◽  
Atomic Layer Deposition ◽  
Leakage Current ◽  
High Dielectric Constant ◽  
Atomic Layer ◽  
Low Leakage ◽  
Low Leakage Current ◽  
Layer Deposition ◽  
High Dielectric

High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition

2004 ◽  
Vol 85 (18) ◽  
pp. 4112-4114 ◽  
Author(s):  
Seong Keun Kim ◽  
Wan-Don Kim ◽  
Kyung-Min Kim ◽  
Cheol Seong Hwang ◽  
Jaehack Jeong
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Atomic Layer Deposition ◽  
High Dielectric Constant ◽  
Atomic Layer ◽  
Tio2 Thin Films ◽  
Layer Deposition ◽  
High Dielectric

Synchrotron X-ray reflectivity study of high dielectric constant alumina thin films prepared by atomic layer deposition

2006 ◽  
Vol 510 (1-2) ◽  
pp. 159-163 ◽  
Author(s):  
Yongtaek Hwang ◽  
Kyuyoung Heo ◽  
Chang Hwan Chang ◽  
Man Kil Joo ◽  
Moonhor Ree
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Atomic Layer Deposition ◽  
High Dielectric Constant ◽  
Atomic Layer ◽  
X Ray ◽  
Layer Deposition ◽  
High Dielectric

Antimicrobial coatings grown by the atomic layer deposition technique

2015 ◽  
Author(s):  
Lukasz Wachnicki ◽  
Sylwia Gieraltowska ◽  
Bartlomiej S. Witkowski ◽  
Marek Godlewski ◽  
Michal M. Godlewski ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Technique ◽  
Antimicrobial Coatings ◽  
Layer Deposition ◽  
Atomic Layer Deposition Technique

Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique

2002 ◽  
Vol 92 (11) ◽  
pp. 6739-6742 ◽  
Author(s):  
J. B. Kim ◽  
D. R. Kwon ◽  
K. Chakrabarti ◽  
Chongmu Lee ◽  
K. Y. Oh ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dielectric Behavior ◽  
Deposition Technique ◽  
Layer Deposition ◽  
Atomic Layer Deposition Technique
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