atomic layer deposition technique
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RSC Advances ◽  
2020 ◽  
Vol 10 (31) ◽  
pp. 18073-18081
Author(s):  
D. Arl ◽  
V. Rogé ◽  
N. Adjeroud ◽  
B. R. Pistillo ◽  
M. Sarr ◽  
...  

In this study, less contaminated and porous SiO2 films were grown via ALD at room temperature.


2020 ◽  
Vol 8 (16) ◽  
pp. 7836-7846 ◽  
Author(s):  
Huibing He ◽  
Huan Tong ◽  
Xueyang Song ◽  
Xiping Song ◽  
Jian Liu

Nanoscale Al2O3 coating by an atomic layer deposition technique enabled safe and dendrite-free Zn anodes for rechargeable aqueous zinc-ion batteries.


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