Background:
Microreactor devices have attracted increasing attention over the last years due to their high surface-to-volume ratio which ensures a high heat and mass transfer, short molecular diffusion distance and greater spatial illumination homogeneity compared to traditional reactors.
Objective:
The aim of this study was to model the kinetics of photodegradation of 2-propanol over TiO2-based thin films in a gas-phase batch-reactor and simulate their performance in a microreactor device.
Methods:
The reaction was carried out in a gas-phase batch-reactor assessing the reactivity of a single-layer nitrogen (N)-doped TiO2 and a bilayer consisting of N-doped TiO2 as a bottom layer and copper (Cu)-doped TiO2 as a top layer. The kinetics of the photocatalytic process was modelled by Langmuir–Hinshelwood (LH) model. The constants obtained from LH model were used to simulate the performance of the photocatalysts in a microreactor operating in a continuous flow mode and investigating the effect of the volumetric flow rate (Q), initial concentration of pollutant (Co), number of microchannels (n) and microchannel length (l) on the photodegradation of 2-propanol.
Results:
N-Cu-TiO2 exhibited a higher reactivity but a lower to adsorption ability towards the target pollutant compared to N-TiO2. To maximize and leverage the advantages of microreactor, optimal operating conditions for a continuous flow mode, at steady state, should be moderately low Q and Co, long l and moderate n that minimizes flow maldistribution in parallel.
Conclusion:
The findings in this work could serve as a basis to design and fabricate efficient microreactors for the removal of VOC in air purification applications.
