The role of surface inhomogeneities in corrosion processes-electrochemical impedance spectroscopy (EIS) on different aluminium oxide films

1989 ◽  
Vol 29 (2-3) ◽  
pp. 279-288 ◽  
Author(s):  
K. Jüttner ◽  
W.J. Lorenz ◽  
W. Paatsch
Keyword(s):  
Electrochemical Impedance Spectroscopy ◽  
Impedance Spectroscopy ◽  
Electrochemical Impedance ◽  
Oxide Films ◽  
Aluminium Oxide

scholarly journals Elucidation of the role of guanidinium incorporation in single-crystalline MAPbI3 perovskite on ion migration and activation energy

2020 ◽  
Vol 22 (20) ◽  
pp. 11467-11473 ◽  
Author(s):  
Apurba Mahapatra ◽  
Rashmi Runjhun ◽  
Jan Nawrocki ◽  
Janusz Lewiński ◽  
Abul Kalam ◽  
...  
Keyword(s):  
Activation Energy ◽  
Electrochemical Impedance Spectroscopy ◽  
Impedance Spectroscopy ◽  
Electrochemical Impedance ◽  
Temperature Dependent ◽  
Ion Migration ◽  
Single Crystalline

We have studied the effect of guanidinium incorporation in a single-crystalline MAPbI3 perovskite on ion migration using temperature-dependent electrochemical impedance spectroscopy.

scholarly journals Characterization of Oxide Film of Implantable Metals by Electrochemical Impedance Spectroscopy

Materials ◽  
2019 ◽  
Vol 12 (21) ◽  
pp. 3466 ◽  
Author(s):  
Okazaki
Keyword(s):  
Electrochemical Impedance Spectroscopy ◽  
Impedance Spectroscopy ◽  
Oxide Film ◽  
Electrochemical Impedance ◽  
Saturated Calomel Electrode ◽  
Oxide Films ◽  
Relative Dielectric Constant ◽  
Open Circuit ◽  
Thin Oxide Film ◽  
Transmission Electron

The oxide film resistance (RP) and capacitance (CCPE) diagrams of implantable metals (commercially pure Ti, four types of Ti alloys, Co–28Cr–6Mo alloy, and stainless steel) were investigated by electrochemical impedance spectroscopy (EIS). The thin oxide film formed on each implantable metal surface was observed in situ by field-emission transmission electron microscopy (FE-TEM). The Ti–15Zr–4Nb–1Ta and Ti–15Zr–4Nb–4Ta alloys had higher oxygen concentrations in the oxide films than the Ti–6Al–4V alloy. The thickness (d) of the TiO2 oxide films increased from approximately 3.5 to 7 nm with increasing anodic polarization potential from the open-circuit potential to a maximum of 0.5 V vs. a saturated calomel electrode (SCE) in 0.9% NaCl and Eagle’s minimum essential medium. RP for the Ti–15Zr–4Nb–1Ta and Ti–15Zr–4Nb–4Ta alloys was proportional to d obtained by FE-TEM. CCPE was proportional to 1/d. RP tended to decrease with increasing CCPE. RP was large (maximum: 13 MΩ·cm2) and CCPE was small (minimum: 12 μF·cm−2·sn−1, n = 0.94) for the Ti–15Zr–4Nb–(0 to 4)Ta alloys. The relative dielectric constant (εr) and resistivity (kOX) of the oxide films formed on these alloys were 136 and 2.4 × 106–1.8 × 107 (MΩ·cm), respectively. The Ta-free Ti–15Zr–4Nb alloy is expected to be employed as an implantable material for long-term use.

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