Optical properties of ZnSeZnTe strained layer superlattices prepared by atomic layer epitaxy

1990 ◽  
Vol 101 (1-4) ◽  
pp. 81-85 ◽  
Author(s):  
Yasushi Takemura ◽  
Shiro Dosho ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi
1991 ◽  
Vol 115 (1-4) ◽  
pp. 324-327 ◽  
Author(s):  
Y. Sakuma ◽  
M. Ozeki ◽  
K. Kodama ◽  
N. Ohtsuka

1989 ◽  
Vol 95 (1-4) ◽  
pp. 580-583 ◽  
Author(s):  
Shiro Dosho ◽  
Yasushi Takemura ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi

1991 ◽  
Vol 111 (1-4) ◽  
pp. 802-806 ◽  
Author(s):  
Yasushi Takemura ◽  
Hideki Nakanishi ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi ◽  
Yoshio Nakamura ◽  
...  

1991 ◽  
Vol 222 ◽  
Author(s):  
M. Konagai ◽  
Y. Takemura ◽  
H. Nakanishi ◽  
K. Takahashi

ABSTRACTRecent advances in understanding the ALE (atomic layer epitaxy) growth of ZnSe, ZnS and ZnTe are reviewed. The Ideal ALE growth is obtained in the substrate temperature range of 250–350°C for ZnSe. In the ALE growth of ZnSe and ZnTe, a unique self-limiting mechanism is observed, in which the deposition rate saturates at 0.5 monolayer per cycle. Furthermore, applications of ALE of II–VI compounds to the growth of strained layer superlattices are also reviewed.


1996 ◽  
Vol 80 (4) ◽  
pp. 2363-2366 ◽  
Author(s):  
Hiroyuki Fujiwara ◽  
Toshiyuki Nabeta ◽  
Isamu Shimizu ◽  
Takashi Yasuda

Author(s):  
G. Duggan ◽  
K. J. Moore ◽  
K. Woodbridge ◽  
C. Roberts ◽  
N. J. Pulsford ◽  
...  

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