Characterization of YBa2Cu3O7−x thin films deposited by high pressure oxygen sputtering

1994 ◽  
Vol 89 (8) ◽  
pp. 713-717 ◽  
Author(s):  
G.K. Muralidhar ◽  
G. Mohan Rao ◽  
S. Mohan ◽  
V.N. Kulkarni ◽  
T.V. Balasubramanian
Pramana ◽  
1993 ◽  
Vol 40 (2) ◽  
pp. 119-122 ◽  
Author(s):  
V V Srinivasu ◽  
S V Bhat ◽  
G K Muralidhar ◽  
G Mohan Rao ◽  
S Mohan

2015 ◽  
Vol 3 (14) ◽  
pp. 3438-3444 ◽  
Author(s):  
Y. Lin ◽  
D. Y. Feng ◽  
M. Gao ◽  
Y. D. Ji ◽  
L. B. Jin ◽  
...  

High pressure oxygen annealing could reduce the dielectric loss in CCTO films as well as induce obvious difference in strain status.


2002 ◽  
Vol 41 (Part 2, No. 10B) ◽  
pp. L1164-L1166 ◽  
Author(s):  
Takeshi Kijima ◽  
Yoshihito Kawashima ◽  
Yasushi Idemoto ◽  
Hiroshi Ishiwara

2006 ◽  
Vol 376-377 ◽  
pp. 752-755 ◽  
Author(s):  
B.I. Kim ◽  
S.C. Kim ◽  
B.C. Shin ◽  
T.S. Kim ◽  
M.Y. Jung ◽  
...  

1988 ◽  
Vol 66 (6) ◽  
pp. 661-665 ◽  
Author(s):  
U. Poppe ◽  
J. Schubert ◽  
R.R. Arons ◽  
W. Evers ◽  
C.H. Freiburg ◽  
...  

Author(s):  
Brian Drouin ◽  
Jiajun Hoo ◽  
V. Devi ◽  
D. Benner ◽  
David Robichaud ◽  
...  

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