Direct production of crystalline superconducting thin films of YBa2Cu3O7 by high-pressure oxygen sputtering

1988 ◽  
Vol 66 (6) ◽  
pp. 661-665 ◽  
Author(s):  
U. Poppe ◽  
J. Schubert ◽  
R.R. Arons ◽  
W. Evers ◽  
C.H. Freiburg ◽  
...  
Keyword(s):  
Thin Films ◽  
High Pressure ◽  
Superconducting Thin Films ◽  
Direct Production ◽  
Pressure Oxygen ◽  
High Pressure Oxygen

scholarly journals Critical current densities of high pressure oxygen sputtered thin films of YBa2Cu3O7−x by non-resonant rf absorption method

Pramana ◽  
1993 ◽  
Vol 40 (2) ◽  
pp. 119-122 ◽  
Author(s):  
V V Srinivasu ◽  
S V Bhat ◽  
G K Muralidhar ◽  
G Mohan Rao ◽  
S Mohan
Keyword(s):  
Thin Films ◽  
High Pressure ◽  
Critical Current ◽  
Absorption Method ◽  
Pressure Oxygen ◽  
High Pressure Oxygen ◽  
Current Densities

Reducing dielectric loss in CaCu3Ti4O12 thin films by high-pressure oxygen annealing

2015 ◽  
Vol 3 (14) ◽  
pp. 3438-3444 ◽  
Author(s):  
Y. Lin ◽  
D. Y. Feng ◽  
M. Gao ◽  
Y. D. Ji ◽  
L. B. Jin ◽  
...  
Keyword(s):  
Thin Films ◽  
High Pressure ◽  
Dielectric Loss ◽  
Oxygen Annealing ◽  
Pressure Oxygen ◽  
High Pressure Oxygen ◽  
Strain Status

High pressure oxygen annealing could reduce the dielectric loss in CCTO films as well as induce obvious difference in strain status.

Effect of High-Pressure Oxygen Annealing on Bi2SiO5-Added Ferroelectric Thin Films

2002 ◽  
Vol 41 (Part 2, No. 10B) ◽  
pp. L1164-L1166 ◽  
Author(s):  
Takeshi Kijima ◽  
Yoshihito Kawashima ◽  
Yasushi Idemoto ◽  
Hiroshi Ishiwara
Keyword(s):  
Thin Films ◽  
High Pressure ◽  
Ferroelectric Thin Films ◽  
Oxygen Annealing ◽  
Pressure Oxygen ◽  
High Pressure Oxygen

High-pressure oxygen treatment of ZnO thin films

2006 ◽  
Vol 376-377 ◽  
pp. 752-755 ◽  
Author(s):  
B.I. Kim ◽  
S.C. Kim ◽  
B.C. Shin ◽  
T.S. Kim ◽  
M.Y. Jung ◽  
...  
Keyword(s):  
Thin Films ◽  
High Pressure ◽  
Zno Thin Films ◽  
Pressure Oxygen ◽  
Oxygen Treatment ◽  
High Pressure Oxygen

Characterization of YBa2Cu3O7−x thin films deposited by high pressure oxygen sputtering

1994 ◽  
Vol 89 (8) ◽  
pp. 713-717 ◽  
Author(s):  
G.K. Muralidhar ◽  
G. Mohan Rao ◽  
S. Mohan ◽  
V.N. Kulkarni ◽  
T.V. Balasubramanian
Keyword(s):  
Thin Films ◽  
High Pressure ◽  
Pressure Oxygen ◽  
High Pressure Oxygen

HIGH PRESSURE OXYGEN A-BAND SPECTRA

2015 ◽  
Author(s):  
Brian Drouin ◽  
Jiajun Hoo ◽  
V. Devi ◽  
D. Benner ◽  
David Robichaud ◽  
...  
Keyword(s):  
High Pressure ◽  
Pressure Oxygen ◽  
High Pressure Oxygen ◽  
Band Spectra

High pressure oxygen iodine laser based on twisted flow singlet oxygen generator

2001 ◽  
Author(s):  
B. Vyskubenko ◽  
A. Adamenkov ◽  
S. Ilyin ◽  
Yu. Kolobyanin ◽  
I. Krukovsky ◽  
...  
Keyword(s):  
High Pressure ◽  
Singlet Oxygen ◽  
Iodine Laser ◽  
Pressure Oxygen ◽  
Twisted Flow ◽  
Oxygen Generator ◽  
Singlet Oxygen Generator ◽  
High Pressure Oxygen

Basic Characteristics of a Simultaneous Double-Side CMP Machine, Housed in a Sealed, Pressure-Resistant Container

2010 ◽  
Vol 447-448 ◽  
pp. 61-65 ◽  
Author(s):  
Kei Kitamura ◽  
Toshiro K. Doi ◽  
Syuhei Kurokawa ◽  
Yoji Umezaki ◽  
Yoji Matsukawa ◽  
...  
Keyword(s):  
High Pressure ◽  
Single Crystal ◽  
Effective Action ◽  
Single Crystal Silicon ◽  
Crystal Silicon ◽  
Pressure Oxygen ◽  
Gas Atmosphere ◽  
High Pressure Oxygen ◽  
Oxygen Gas ◽  
Basic Characteristics

We designed and manufactured a prototype of a unique CMP machine, which can perform double-side CMP simultaneously in a sealed and pressure container as regarding effective action of the processing atmosphere around workpieces as important. Polishing experiments with single crystal silicon (Si) wafers (100) are performed by charging the container with various gases. As a result, the removal rates increased by up to 25% under high pressure oxygen gas atmosphere.

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