A computer-aided simulation model for the I–V characteristic of M-n-p silicon Schottky-barrier diodes produced by use of low-energy arsenic-ion implantation
1983 ◽
Vol 26
(9)
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pp. 893-900
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1997 ◽
Vol 41
(5)
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pp. 802-805
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2000 ◽
Vol 44
(11)
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pp. 1879-1885
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2019 ◽
Vol 40
(9)
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pp. 1487-1490
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