In situ characterization of SiO2 etching with second harmonic generation and ellipsometry
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2010 ◽
Vol 28
(5)
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pp. 458-471
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2006 ◽
Vol 23
(5)
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pp. 351-359
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1998 ◽
Vol 102
(43)
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pp. 8569-8573
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1989 ◽
Vol 163
(2-3)
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pp. 123-128
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1999 ◽
Vol 103
(49)
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pp. 10729-10732
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