Quantitative X-ray fluorescence analysis of boron in thin films of borophosphosilicate glasses

1988 ◽  
Vol 157 (2) ◽  
pp. 325-336 ◽  
Author(s):  
M. Schuster ◽  
L. Müller ◽  
K.E. Mauser ◽  
R. Straub
Keyword(s):  
Thin Films ◽  
Fluorescence Analysis ◽  
X Ray

How to Use the Features of Total Reflection of X-Rays for Energy Dispersive XRF

1988 ◽  
Vol 32 ◽  
pp. 105-114 ◽  
Author(s):  
H. Schwenke ◽  
W. Berneike ◽  
J. Knoth ◽  
U. Weisbrod
Keyword(s):  
Thin Films ◽  
Penetration Depth ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Rays ◽  
X Ray ◽  
Characteristic Features ◽  
Respective Characteristic ◽  
Nanometer Regime ◽  
Sensitive Method

AbstractThe total reflection of X-rays is mainly determined by three parameters , that is the orltical angle, the reflectivity and the penetration depth. For X-ray fluorescence analysis the respective characteristic features can be exploited in two rather different fields of application. In the analysis of trace elements in samples placed as thin films on optical flats, detection limits as low as 2 pg or 0.05 ppb, respectively, have been obtained. In addition, a penetration depth in the nanometer regime renders Total Reflection XRF an inherently sensitive method for the elemental analysis of surfaces. This paper outlines the main physical and constructional parameters for instrumental design and quantitation in both branches of TXRF.

scholarly journals Validation of secondary fluorescence excitation in quantitative X-ray fluorescence analysis of thin alloy films

2020 ◽  
Vol 35 (8) ◽  
pp. 1664-1670
Author(s):  
André Wählisch ◽  
Cornelia Streeck ◽  
Philipp Hönicke ◽  
Burkhard Beckhoff
Keyword(s):  
Thin Films ◽  
Fluorescence Analysis ◽  
Fluorescence Excitation ◽  
Alloy Films ◽  
X Ray ◽  
Secondary Fluorescence

Reference-free X-ray fluorescence analysis of multilayered, alloyed thin films in the μm regime with significant secondary fluorescence contributions.

X-Ray Fluorescence Analysis of Multi-Layer Thin Films

1985 ◽  
Vol 29 ◽  
pp. 395-402 ◽  
Author(s):  
T. C. Huang ◽  
W. Parrish
Keyword(s):  
Thin Films ◽  
Single Layer ◽  
Fluorescence Analysis ◽  
Parameter Method ◽  
Fundamental Parameter ◽  
X Ray ◽  
Triple Layer ◽  
Layer Thin Film ◽  
Fundamental Parameter Method

AbstractThe characterization of multi-layer thin films by X-ray fluorescence using the fundamental parameter method and the LAMA-III program is described. Analyses of a double-layer FeMn/NiFe and two triple-layer NiFe/Cu/Cr and Cr/Cu/NiFe specimens show that the complex inter-layer absorption and secondary fluorescence effects were properly corrected. The compositions and thicknesses of all layers agreed to ±2% with corresponding single-layer films, a precisian comparable with bulk and single-layer thin film analyses.

Sign in / Sign up

Export Citation Format

Share Document