Tailoring silicon oxide film properties by tuning the laser beam-to-substrate distance in ArF laser-induced chemical vapor deposition

1994 ◽  
Vol 241 (1-2) ◽  
pp. 80-83 ◽  
Author(s):  
T. Szörényi ◽  
P. González ◽  
E. Garcá ◽  
J. Pou ◽  
D. Fernández ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Oxide Film ◽  
Laser Beam ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Film Properties ◽  
Silicon Oxide Film ◽  
Substrate Distance ◽  
Arf Laser

Self-limiting chemical vapor deposition of an ultra-thin silicon oxide film using tri-(tert-butoxy)silanol

2001 ◽  
Vol 397 (1-2) ◽  
pp. 78-82 ◽  
Author(s):  
K.A. Miller ◽  
C. John ◽  
K.Z. Zhang ◽  
K.T. Nicholson ◽  
F.R. McFeely ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Oxide Film ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Silicon Oxide Film ◽  
Thin Silicon

Hydrogen incorporation in silicon oxide films deposited by ArF laser-induced chemical vapor deposition

1995 ◽  
Vol 187 ◽  
pp. 75-80 ◽  
Author(s):  
E.G. Parada ◽  
P. González ◽  
J. Serra ◽  
B. León ◽  
M. Pérez-Amor ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Hydrogen Incorporation ◽  
Arf Laser
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