Definition of geometries with complicated, curved boundaries for electron beam pattern generation

1989 ◽  
Vol 9 (1-4) ◽  
pp. 495-497 ◽  
Author(s):  
U. Klein ◽  
F. Götz
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern ◽  
Curved Boundaries ◽  
Definition Of

Electron beam pattern generation in thin‐film organic dianhydrides

1982 ◽  
Vol 40 (1) ◽  
pp. 93-95 ◽  
Author(s):  
Paul H. Schmidt ◽  
David C. Joy ◽  
Martin L. Kaplan ◽  
William L. Feldmann
Keyword(s):  
Thin Film ◽  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern

Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation

1999 ◽  
Author(s):  
Jan M. Chabala ◽  
Frank E. Abboud ◽  
Robert L. Dean ◽  
Suzanne Weaver ◽  
Damon M. Cole ◽  
...  
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern ◽  
Writing Strategy

Advanced electron-beam pattern generation technology for 180-nm masks

1997 ◽  
Author(s):  
Frank E. Abboud ◽  
Charles A. Sauer ◽  
William Wang ◽  
Matthew Vernon ◽  
Richard Prior ◽  
...  
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern ◽  
Generation Technology

A Fast Turn Around Electron-Beam Pattern Generation System

1973 ◽  
Vol 10 (6) ◽  
pp. 1016-1019 ◽  
Author(s):  
B. P. Piwczyk ◽  
K. G. McQuhae
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern ◽  
Generation System

Further advances in electron-beam pattern generation technology for 180-nm masks

1998 ◽  
Author(s):  
Frank E. Abboud ◽  
Charles A. Sauer ◽  
Matthew Vernon ◽  
Thomas P. Coleman ◽  
Robert L. Dean ◽  
...  
Keyword(s):  
Electron Beam ◽  
Pattern Generation ◽  
Beam Pattern ◽  
Generation Technology

Device Photolithography: The Electron Beam Pattern Generator

1970 ◽  
Vol 49 (9) ◽  
pp. 2077-2094 ◽  
Author(s):  
W. Samaroo ◽  
J. Raamot ◽  
P. Parry ◽  
G. Robertson
Keyword(s):  
Electron Beam ◽  
Pattern Generator ◽  
Beam Pattern

Cathodoluminescence of SiO2/Si System

2009 ◽  
Vol 156-158 ◽  
pp. 487-492 ◽  
Author(s):  
M.V. Zamoryanskaya
Keyword(s):  
Activation Energy ◽  
Electron Beam ◽  
Rise Time ◽  
Silicon Oxide ◽  
Beam Current ◽  
Electron Beam Current ◽  
Electron Traps ◽  
Definition Of ◽  
Luminescent Centers

In this paper the new method for determination of luminescent centers concentration are discussed. While the possibility of electron traps determination and definition of its activation energy are suggested. The cathodoluminescent (CL) method was used. The determination of luminescent centers concentration in silicon oxide is based on the measurements of dependences of CL intensity on electron beam current. The presence and energy of activation of electron traps were studied by measurement of rise time and decay of luminescent band during the stationary irradiation of silica by electron beam.

Definition of 15nm half pitch grating structures by electron beam lithography double exposure techniques

2013 ◽  
Vol 110 ◽  
pp. 224-228 ◽  
Author(s):  
Jens Bolten ◽  
Namil Koo ◽  
Thorsten Wahlbrink ◽  
Heinrich Kurz
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Double Exposure ◽  
Definition Of

Raster shaped beam pattern generation

1999 ◽  
Vol 17 (6) ◽  
pp. 2927 ◽  
Author(s):  
S. A. Rishton ◽  
J. K. Varner ◽  
L. H. Veneklasen ◽  
V. Boegli ◽  
A. L. Sagle ◽  
...  
Keyword(s):  
Pattern Generation ◽  
Beam Pattern ◽  
Shaped Beam
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