Radio frequency magnetron sputtering growth and characterization of indium-tin oxide (ITO) thin films for NO2 gas sensors

Sensors and Actuators ◽

10.1016/0250-6874(88)87013-6 ◽

1988 ◽

Vol 15 (3) ◽

pp. 235-242 ◽

Author(s):

G. Sberveglieri ◽

S. Groppelli ◽

G. Coccoli

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Gas Sensors ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

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Highly Transparent Conducting Indium Tin Oxide Thin Films Prepared by Radio Frequency Magnetron Sputtering and Thermal Annealing

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2019.16242 ◽

2019 ◽

Vol 19 (3) ◽

pp. 1455-1462 ◽

Author(s):

Bhaskar Parida ◽

Youngun Gil ◽

Hyunsoo Kim

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Thermal Annealing ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Transparent Conducting

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(400)-Oriented indium tin oxide thin films with high mobility and figure of merit prepared by radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2020.137972 ◽

2020 ◽

Vol 704 ◽

pp. 137972 ◽

Author(s):

Ajinkya Bhorde ◽

Ashok Jadhavar ◽

Ravindra Waykar ◽

Shruthi Nair ◽

Haribhau Borate ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Figure Of Merit ◽

High Mobility ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films

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Structural and optical properties of BaxSr1−xTiO3 thin films on indium tin oxide/quartz substrates prepared by radio-frequency magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.2202094 ◽

2006 ◽

Vol 99 (11) ◽

pp. 114904 ◽

Author(s):

W. J. Leng ◽

C. R. Yang ◽

J. H. Zhang ◽

H. W. Chen ◽

H. Ji ◽

...

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Optical Properties ◽

Quartz Substrates

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Effect of hydrogen partial pressure on optoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering method

Journal of Applied Physics ◽

10.1063/1.370834 ◽

1999 ◽

Vol 86 (2) ◽

pp. 974-980 ◽

Author(s):

Keran Zhang ◽

Furong Zhu ◽

C. H. A. Huan ◽

A. T. S. Wee

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Partial Pressure ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Hydrogen Partial Pressure ◽

Optoelectronic Properties ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Preparation and characterization of transparent conductive zinc doped tin oxide thin films prepared by radio-frequency magnetron sputtering

Journal of Wuhan University of Technology-Mater Sci Ed ◽

10.1007/s11595-011-0235-z ◽

2011 ◽

Vol 26 (3) ◽

pp. 388-392 ◽

Author(s):

Jiang Zhao ◽

Jiamiao Ni ◽

Xiujian Zhao ◽

Yuli Xiong

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films

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Preparation and Characterization of 70TeO2-30WO3 Glass Thin Films by Radio-Frequency Magnetron Sputtering Method

Solid State Phenomena - Advances in Nanomaterials and Processing ◽

10.4028/3-908451-31-0.487 ◽

2007 ◽

pp. 487-490

Author(s):

Jin Hyeok Kim ◽

Ki Young Yoo ◽

Sang Hoon Shin ◽

Sun Hyun Youn ◽

Jong Ha Moon

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Characterization of (Ba,Sr)TiO[sub 3] Thin Films on BaPbO[sub 3] Electrode Prepared by Radio Frequency Magnetron Sputtering

Journal of The Electrochemical Society ◽

10.1149/1.2120307 ◽

2005 ◽

Vol 152 (12) ◽

pp. F213 ◽

Author(s):

Chun-Sheng Liang ◽

Jenn-Ming Wu

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Characterization of (Pb1-xLax)TiO3 thin films grown by radio-frequency magnetron sputtering and their electrical properties

Integrated Ferroelectrics ◽

10.1080/10584589508012264 ◽

1995 ◽

Vol 10 (1-4) ◽

pp. 63-72 ◽

Author(s):

Su-Jin Chae ◽

Sang-Shik Park ◽

Soon-Gil Yoon ◽

Won-Jae Lee ◽

Ho-Gi Kim

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Structural and electrical properties of fluorine-doped zinc tin oxide thin films prepared by radio-frequency magnetron sputtering

Current Applied Physics ◽

10.1016/j.cap.2014.03.020 ◽

2014 ◽

Vol 14 (6) ◽

pp. 850-855 ◽

Author(s):

R. Pandey ◽

S.H. Cho ◽

D.K. Hwang ◽

W.K. Choi

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Structural And Electrical Properties ◽

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Vanadium oxide thin films deposited on indium tin oxide glass by radio-frequency magnetron sputtering

Chinese Physics ◽

10.1088/1009-1963/11/7/317 ◽

2002 ◽

Vol 11 (7) ◽

pp. 737-740 ◽

Author(s):

Wang Xue-Jin ◽

Fei Yun-Jie ◽

Xiong Yan-Yun ◽

Nie Yu-Xin ◽

Feng Ke-An ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Vanadium Oxide ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Glass ◽

Radio Frequency Magnetron Sputtering ◽

Vanadium Oxide Thin Films ◽

Indium Tin Oxide Glass

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