Effect of hydrogen partial pressure on optoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering method
2019 ◽
Vol 19
(3)
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pp. 1455-1462
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1988 ◽
Vol 15
(3)
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pp. 235-242
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2015 ◽
Vol 136
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pp. 1409-1417
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Vol 14
(6)
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pp. 850-855
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2003 ◽
Vol 21
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pp. 1069-1072
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