Effect of hydrogen partial pressure on optoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering method

1999 ◽  
Vol 86 (2) ◽  
pp. 974-980 ◽  
Author(s):  
Keran Zhang ◽  
Furong Zhu ◽  
C. H. A. Huan ◽  
A. T. S. Wee
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