The kinetics of silicon dioxide chemical vapour deposition III: Experimental verification of the model

Surface and Coatings Technology ◽

10.1016/0257-8972(86)90103-9 ◽

1986 ◽

Vol 27 (3) ◽

pp. 219-237 ◽

Author(s):

Piotr B. Grabiec ◽

Jan PryyŁuski

Keyword(s):

Silicon Dioxide ◽

Chemical Vapour Deposition ◽

Experimental Verification ◽

Vapour Deposition ◽

Chemical Vapour ◽

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The kinetics of silicon dioxide chemical vapour deposition II: The model of the process

Surface Technology ◽

10.1016/0376-4583(85)90083-4 ◽

1985 ◽

Vol 25 (4) ◽

pp. 315-325 ◽

Author(s):

Piotr B. Grabiec ◽

Jan Przyłuski

Keyword(s):

Silicon Dioxide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

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The kinetics of silicon dioxide chemical vapour deposition I: Surface chemical reactions

Surface Technology ◽

10.1016/0376-4583(85)90082-2 ◽

1985 ◽

Vol 25 (4) ◽

pp. 307-313 ◽

Author(s):

Piotr B. Grabiec ◽

Jan Przyłuski

Keyword(s):

Silicon Dioxide ◽

Chemical Reactions ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Surface Chemical ◽

Surface Chemical Reactions ◽

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Kinetics of the initial stages of film formation during low pressure chemical vapour deposition of polysilicon by pyrolysis of silane

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:2001324 ◽

2001 ◽

Vol 11 (PR3) ◽

pp. Pr3-189-Pr3-196

Author(s):

L. Zambov ◽

B. Caussat ◽

R. Boubeker ◽

J.-P. Couderc

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Film Formation ◽

Chemical Vapour ◽

Low Pressure ◽

Pressure Chemical ◽

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A general model of the chemical vapour deposition process II: Experimental verification for some particular cases

Surface Technology ◽

10.1016/0376-4583(80)90033-3 ◽

1980 ◽

Vol 10 (6) ◽

pp. 455-480 ◽

Author(s):

Jacek Korec

Keyword(s):

Chemical Vapour Deposition ◽

Experimental Verification ◽

General Model ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Process ◽

Chemical Vapour Deposition Process

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Growth Mode and Kinetics of Atmospheric Pressure Chemical Vapour Deposition of β-SiC on Si(100) Substrate

Materials Science Forum ◽

10.4028/www.scientific.net/msf.264-268.227 ◽

1998 ◽

Vol 264-268 ◽

pp. 227-230 ◽

Author(s):

Gabriel Ferro ◽

H. Vincent ◽

Yves Monteil ◽

Didier Chaussende ◽

J. Bouix

Keyword(s):

Chemical Vapour Deposition ◽

Atmospheric Pressure ◽

Vapour Deposition ◽

Chemical Vapour ◽

Growth Mode ◽

Pressure Chemical ◽

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Physical and electrical analysis of silicon dioxide thin films produced by electron-cyclotron resonance chemical-vapour deposition

Microelectronic Engineering ◽

10.1016/s0167-9317(97)00014-2 ◽

1997 ◽

Vol 36 (1-4) ◽

pp. 53-60 ◽

Author(s):

D. Landheer ◽

L.-Å. Ragnarsson ◽

S. Belkouch

Keyword(s):

Silicon Dioxide ◽

Chemical Vapour Deposition ◽

Cyclotron Resonance ◽

Vapour Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapour ◽

Electron Cyclotron ◽

Electrical Analysis

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Electron cyclotron resonance (ECR) plasma-enhanced chemical vapour deposition of silicon dioxide on strained-SiGe films using tetraethylorthosilicate

Bulletin of Materials Science ◽

10.1007/bf02744953 ◽

1998 ◽

Vol 21 (4) ◽

pp. 283-286

Author(s):

L K Bera ◽

S K Ray ◽

H D Banerjee ◽

C K Maiti

Keyword(s):

Silicon Dioxide ◽

Chemical Vapour Deposition ◽

Cyclotron Resonance ◽

Vapour Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapour ◽

Electron Cyclotron ◽

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Formation of high-quality silicon dioxide films by electron cyclotron resonance plasma oxidation and plasma-enhanced chemical vapour deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)08902-x ◽

1997 ◽

Vol 293 (1-2) ◽

pp. 52-62 ◽

Author(s):

D. Landheer ◽

J.E. Hulse ◽

T. Quance

Keyword(s):

Silicon Dioxide ◽

Chemical Vapour Deposition ◽

Cyclotron Resonance ◽

Vapour Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapour ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

High Quality ◽

Resonance Plasma

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Fast thermal kinetic growth of silicon dioxide films on InP by rapid thermal low-pressure chemical vapour deposition

Semiconductor Science and Technology ◽

10.1088/0268-1242/7/4/025 ◽

1992 ◽

Vol 7 (4) ◽

pp. 583-594 ◽

Author(s):

A Katz ◽

A Feingold ◽

S J Pearton ◽

U K Chakrabarti ◽

K M Lee

Keyword(s):

Silicon Dioxide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Kinetic Growth ◽

Silicon Dioxide Films ◽

Pressure Chemical

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On the role of carrier gas in the deposition kinetics of SiO2 films produced by low temperature chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(87)90220-3 ◽

1987 ◽

Vol 146 (2) ◽

pp. 183-189 ◽

Author(s):

C. Cobianu ◽

C. Pavelescu ◽

E. Segal

Keyword(s):

Low Temperature ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Kinetics ◽

Carrier Gas ◽

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