The reduction of Pt(IV) to Pt(II) by X-ray and argon-ion bombardment; evidence from X-ray photoelectron spectroscopy

1980 ◽  
Vol 18 (2) ◽  
pp. 275-278 ◽  
Author(s):  
A. Katrib
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ion Bombardment ◽  
X Ray ◽  
Argon Ion Bombardment ◽  
Argon Ion

Surface Analysis of the Environmental Corrosion of Zinalco (Zn-22Al-2Cu) Alloy

2003 ◽  
Vol 781 ◽  
Author(s):  
R. Guerrero-Penalv ◽  
M.H. Farías ◽  
L. Cota-Araiza
Keyword(s):  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Concentration Ratio ◽  
Auger Electron ◽  
Surface Composition ◽  
Initial Growth ◽  
Atomic Concentration ◽  
X Ray ◽  
Argon Ion Bombardment ◽  
Argon Ion

AbstractThe surface of a set of zinalco (Zn-22Al-2Cu) samples was prepared by mechanical polishing (MP) and by electropolishing (EP). Samples were subjected to environmental corrosion during 56 days and studied by x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS). Differences in relative atomic concentration ratio of Al/Zn in oxides of the surface layer were obtained and they are related to the bulk microstructure. A different corrosion behavior is observed between MP and EP samples and it is explained in terms of surface composition and morphology. The initial growth of corrosion products was observed in EP samples and a corrosion model is proposed. The surface of both types of samples can be modified by lowenergy argon ion bombardment.

scholarly journals Effects of Air Exposure on Hard and Soft X-ray Photoemission Spectra of Ultrananocrystalline Diamond/Amorphous Carbon Composite Films

Coatings ◽  
2018 ◽  
Vol 8 (10) ◽  
pp. 359 ◽  
Author(s):  
Mohamed Egiza ◽  
Hiroshi Naragino ◽  
Aki Tominaga ◽  
Kenji Hanada ◽  
Kazutaka Kamitani ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Composite Films ◽  
Ion Bombardment ◽  
Nanocrystalline Diamond ◽  
Photoemission Spectroscopy ◽  
X Ray ◽  
Structural Evaluation ◽  
Ultrananocrystalline Diamond ◽  
Argon Ion Bombardment ◽  
Argon Ion

Hard X-ray photoemission spectroscopy (HAXPES) was employed for the structural evaluation of ultrananocrystalline diamond/amorphous carbon (UNCD/a-C) composite films deposited on cemented carbide substrates, at substrate temperatures up to 550 °C by coaxial arc plasma deposition. The results were compared with those of soft X-ray photoemission spectroscopy (SXPES). Since nanocrystalline diamond grains are easily destroyed by argon ion bombardment, the structural evaluation of UNCD/a-C films, without the argon ion bombardment, is preferable for precise evaluation. For samples that were preserved in a vacuum box after film preparation, the sp3 fraction estimated from HAXPES is in good agreement with that of SXPES. The substrate temperature dependencies also exhibited good correspondence with that of hardness and Young’s modulus of the films. On the other hand, the sp3 fraction estimated from SXPES for samples that were not preserved in the vacuum box had an apparent deviation from those of HAXPES. Since it is possible for HAXPES to precisely estimate the sp3 fraction without the ion bombardment treatment, HAXPES is a feasible method for UNCD/a-C films, comprising nanocrystalline diamond grains.

Surface Analysis of InSb by X-Ray Photoelectron Spectroscopy (XPS)

1978 ◽  
Vol 33 (5) ◽  
pp. 523-527 ◽  
Author(s):  
R. G. Copperthwaite ◽  
O. A. Kunze ◽  
J. Lloyd ◽  
J. A. Neely ◽  
W. Tuma
Keyword(s):  
Chemical Shift ◽  
Single Crystal ◽  
Photoelectron Spectroscopy ◽  
Surface Oxidation ◽  
X Ray ◽  
Chemical Shift Data ◽  
Argon Ion Bombardment ◽  
Argon Ion ◽  
Chemical Etchant ◽  
Shift Data

Surface compositions of single-crystal specimens of InSb have been investigated by XPS. A correlation between the degree of surface oxidation and the type of chemical etchant used has been found. This interpretation is based on chemical-shift data and argon-ion bombardment experiments, together with XPS results obtained on polycrystalline indium and antimony

Preferential Sputtering of Ni3Al Single Crystals Studied Using Atom-Probe Field-Ion Microscopy and XPS

1981 ◽  
Vol 39 ◽  
pp. 16-17
Author(s):  
M.P. Thomas ◽  
A.R. Waugh ◽  
M.J. Southon ◽  
Brian Ralph
Keyword(s):  
Single Crystals ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Depth Profiling ◽  
Analytical Techniques ◽  
Atom Probe ◽  
Probe Field ◽  
Preferential Sputtering ◽  
Argon Ion Bombardment ◽  
Argon Ion

It is well known that ion-induced sputtering from numerous multicomponent targets results in marked changes in surface composition (1). Preferential removal of one component results in surface enrichment in the less easily removed species. In this investigation, a time-of-flight atom-probe field-ion microscope A.P. together with X-ray photoelectron spectroscopy XPS have been used to monitor alterations in surface composition of Ni3Al single crystals under argon ion bombardment. The A.P. has been chosen for this investigation because of its ability using field evaporation to depth profile through a sputtered surface without the need for further ion sputtering. Incident ion energy and ion dose have been selected to reflect conditions widely used in surface analytical techniques for cleaning and depth-profiling of samples, typically 3keV and 1018 - 1020 ion m-2.

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