Single shot non-perturbative electron beam characterization with a microwiggler

1998 ◽  
pp. II-111-II-112
Author(s):  
P. Catravas ◽  
M. Babzien ◽  
I. Ben-Zvi ◽  
Z. Segalov ◽  
X.-J. Wang ◽  
...  
Author(s):  
Svitozar Serkez ◽  
Gianluca Geloni ◽  
Marc Guetg ◽  
Vitali Kocharyan ◽  
Shan Liu ◽  
...  

Microscopy ◽  
2017 ◽  
Vol 66 (suppl_1) ◽  
pp. i6-i6
Author(s):  
Tomohiro Nishitani ◽  
Akihiro Narita ◽  
Takeshi Tomita ◽  
Shin-ichi Kitamura ◽  
Takashi Meguro ◽  
...  
Keyword(s):  

Materials ◽  
2022 ◽  
Vol 15 (2) ◽  
pp. 571
Author(s):  
Xintian Cai ◽  
Zhen Wang ◽  
Chaoyue Ji ◽  
Xuan Wang ◽  
Zhiyin Gan ◽  
...  

Ultrafast detection is an effective method to reveal the transient evolution mechanism of materials. Compared with ultra-fast X-ray diffraction (XRD), the ultra-fast electron beam is increasingly adopted because the larger scattering cross-section is less harmful to the sample. The keV single-shot ultra-fast electron imaging system has been widely used with its compact structure and easy integration. To achieve both the single pulse imaging and the ultra-high temporal resolution, magnetic lenses are typically used for transverse focus to increase signal strength, while radio frequency (RF) cavities are generally utilized for longitudinal compression to improve temporal resolution. However, the detection signal is relatively weak due to the Coulomb force between electrons. Moreover, the effect of RF compression on the transverse focus is usually ignored. We established a particle tracking model to simulate the electron pulse propagation based on the 1-D fluid equation and the 2-D mean-field equation. Under considering the relativity effect and Coulomb force, the impact of RF compression on the transverse focus was studied by solving the fifth-order Rung–Kutta equation. The results show that the RF cavity is not only a key component of longitudinal compression but also affects the transverse focusing. While the effect of transverse focus on longitudinal duration is negligible. By adjusting the position and compression strength of the RF cavity, the beam spot radius can be reduced from 100 μm to 30 μm under the simulation conditions in this paper. When the number of single pulse electrons remains constant, the electrons density incident on the sample could be increased from 3.18×1012 m−2 to 3.54×1013 m−2, which is 11 times the original. The larger the electron density incident on the sample, the greater the signal intensity, which is more conducive to detecting the transient evolution of the material.


2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Xi Yang ◽  
Weishi Wan ◽  
Lijun Wu ◽  
Victor Smaluk ◽  
Timur Shaftan ◽  
...  

Abstract A preliminary design of a mega-electron-volt (MeV) monochromator with 10−5 energy spread for ultrafast electron diffraction (UED) and ultrafast electron microscopy (UEM) is presented. Such a narrow energy spread is advantageous in both the single shot mode, where the momentum resolution in diffraction is improved, and the accumulation mode, where shot-to-shot energy jitter is reduced. In the single-shot mode, we numerically optimized the monochromator efficiency up to 13% achieving 1.3 million electrons per pulse. In the accumulation mode, to mitigate the efficiency degradation caused by the shot-to-shot energy jitter, an optimized gun phase yields only a mild reduction of the single-shot efficiency, therefore the number of accumulated electrons nearly proportional to the repetition rate. Inspired by the recent work of Qi et al. (Phys Rev Lett 124:134803, 2020), a novel concept of applying reverse bending magnets to adjust the energy-dependent path length difference has been successfully realized in designing a MeV monochromator to achieve the minimum energy-dependent path length difference between cathode and sample. Thanks to the achromat design, the pulse length of the electron bunches and the energy-dependent timing jitter can be greatly reduced to the 10 fs level. The introduction of such a monochromator provides a major step forward, towards constructing a UEM with sub-nm resolution and a UED with ten-femtosecond temporal resolution. The one-to-one mapping between the electron beam parameter and the diffraction peak broadening enables a real-time nondestructive diagnosis of the beam energy spread and divergence. The tunable electric–magnetic monochromator allows the scanning of the electron beam energy with a 10−5 precision, enabling online energy matching for the UEM, on-momentum flux maximizing for the UED and real-time energy measuring for energy-loss spectroscopy. A combination of the monochromator and a downstream chicane enables “two-color” double pulses with femtosecond duration and the tunable delay in the range of 10 to 160 fs, which can potentially provide an unprecedented femtosecond time resolution for time resolved UED.


1995 ◽  
Vol 31 (9) ◽  
pp. 1637-1641 ◽  
Author(s):  
Y.C. Huang ◽  
H. Wang ◽  
R.H. Pantell ◽  
J.F. Schmerge ◽  
J.W. Lewellen ◽  
...  

1983 ◽  
Vol 23 ◽  
Author(s):  
P. Durupt ◽  
D. Barbier ◽  
A. Laugier

ABSTRACTHigh dose (1–7 1017cm−2), low energy (10–40 keV) C implanted Si samples were annealed by conventional thermal procedure and by pulsed electron beam. Characterization is performed by I.R., electron diffraction and Rutherford Backscattering. Effect of PEBA is equivalent to thermal annealing at 900°C. No C redistribution occurs and a poor recrystallization of the SiC formed during implantation is observed.


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