Microstructure and electrical conductivity of nanocrystalline nickel- and nickel oxide/gadolinia-doped ceria thin films

2008 ◽  
Vol 56 (4) ◽  
pp. 677-687 ◽  
Author(s):  
Ulrich P. Muecke ◽  
Silvio Graf ◽  
Urs Rhyner ◽  
Ludwig J. Gauckler
2011 ◽  
Vol 196 (15) ◽  
pp. 6070-6078 ◽  
Author(s):  
Anja Bieberle-Hütter ◽  
Patrick Reinhard ◽  
Jennifer L.M. Rupp ◽  
Ludwig J. Gauckler

2019 ◽  
Vol 13 (4) ◽  
pp. 365-373 ◽  
Author(s):  
F. Hajakbari ◽  
S. Rashvand ◽  
A. Hojabri

Abstract Nanocrystalline nickel oxide (NiO) thin films were successfully grown on quartz substrates by two-step method. In the first step, nickel films were deposited on quartz substrates by DC magnetron sputtering technique. Then, the plasma oxidation of nickel films was used for preparation of nickel oxide. The effect of DC plasma power and treatment time on the structural, morphological and optical properties of the NiO films were investigated by different analyses. XRD results indicated that the plasma powers effectively influenced the structure of films, and the best crystallinity was obtained for plasma power of 15 w and treatment time of 20 min. The XPS, RBS and EDS analysis confirmed the presence of Ni and O elements. The FESEM and AFM images showed a granular structure with spherical shapes of grains. The optical band gap of the films synthesized under different plasma oxidation conditions was also discussed.


2007 ◽  
Vol 90 (26) ◽  
pp. 263108 ◽  
Author(s):  
Annamalai Karthikeyan ◽  
Masaru Tsuchiya ◽  
Chia-Lin Chang ◽  
Shriram Ramanathan

2009 ◽  
Vol 517 (5) ◽  
pp. 1515-1521 ◽  
Author(s):  
Ulrich P. Muecke ◽  
Gary L. Messing ◽  
Ludwig J. Gauckler

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