Ultra smooth NiO thin films on flexible plastic (PET) substrate at room temperature by RF magnetron sputtering and effect of oxygen partial pressure on their properties

Applied Surface Science ◽

10.1016/j.apsusc.2009.11.088 ◽

2010 ◽

Vol 256 (10) ◽

pp. 3142-3147 ◽

Author(s):

S. Nandy ◽

S. Goswami ◽

K.K. Chattopadhyay

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Room Temperature ◽

Rf Magnetron Sputtering ◽

Effect Of Oxygen ◽

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The effect of oxygen partial pressure on physical properties of nano-crystalline silver oxide thin films deposited by RF magnetron sputtering

Crystal Research and Technology ◽

10.1002/crat.201100206 ◽

2011 ◽

pp. n/a-n/a ◽

Author(s):

P. Narayana Reddy ◽

A. Sreedhar ◽

M. Hari Prasad Reddy ◽

S. Uthanna ◽

J. F. Pierson

Keyword(s):

Magnetron Sputtering ◽

Physical Properties ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Silver Oxide ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Nano Crystalline ◽

Effect Of Oxygen

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Oxygen Partial Pressure Influenced Structural, Morphological and Optical Properties of Nanocrystalline ZnO Thin Films Formed by RF Magnetron Sputtering

10.1063/1.3643612 ◽

2011 ◽

Author(s):

R. Subba Reddy ◽

A. Sreedhar ◽

M. Hariprasad Reddy ◽

P. Kondaiah ◽

S. Uthanna ◽

...

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Rf Magnetron Sputtering ◽

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Effect of Oxygen Partial Pressure on the Fabrication and Characterization of LaB6-Doped-NiOx Thin Films Produced By Magnetron Sputtering

ECS Meeting Abstracts ◽

10.1149/ma2017-01/40/1848 ◽

2017 ◽

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Fabrication And Characterization ◽

Effect Of Oxygen

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Influence of oxygen partial pressure and annealing temperature on the physical properties of nanostructured ZnO thin films prepared by RF magnetron sputtering

Advanced Materials Proceedings ◽

10.5185/amp.2018/1416 ◽

2018 ◽

Vol 3 (9) ◽

pp. 570-576

Author(s):

R. Subba Reddy

Keyword(s):

Magnetron Sputtering ◽

Physical Properties ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Annealing Temperature ◽

Rf Magnetron Sputtering ◽

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Orientation control of LaNiO3 thin films by RF magnetron sputtering with different oxygen partial pressure

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2009.05.025 ◽

2009 ◽

Vol 311 (17) ◽

pp. 4241-4246 ◽

Author(s):

Lihui Yang ◽

Genshui Wang ◽

Chaoliang Mao ◽

Yuanyuan Zhang ◽

Ruihong Liang ◽

...

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Rf Magnetron Sputtering ◽

Orientation Control

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The studies of RT electrical resistivities of LaNiO3-δthin films by RF magnetron sputtering with different percentage of oxygen partial pressure at various substrate temperatures

10.1117/12.607751 ◽

2004 ◽

Author(s):

X. D. Zhang ◽

Xiang J. Meng ◽

Jing L. Sun ◽

Gen S. Wang ◽

Tie Lin ◽

...

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Rf Magnetron Sputtering ◽

Electrical Resistivities ◽

Substrate Temperatures

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Effect of oxygen partial pressure on properties of ZnO/Al thin films prepared by pulsed dc reactive magnetron sputtering with SpeedFlo controller

Materials Technology ◽

10.1179/1753555715y.0000000001 ◽

2015 ◽

Vol 30 (4) ◽

pp. 249-256 ◽

Author(s):

C. Y. Liu ◽

F. He ◽

Y. F. Zhang ◽

S. G. Zang ◽

Y. Zuo ◽

...

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Pulsed Dc ◽

Dc Reactive Magnetron Sputtering ◽

Effect Of Oxygen

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Effects of oxygen partial pressure and substrate temperature on the structure and optical properties of MgxZn1−xO thin films prepared by magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2011.02.076 ◽

2011 ◽

Vol 257 (15) ◽

pp. 6554-6559 ◽

Author(s):

Xinghua Zhang ◽

Zunming Lu ◽

Fanbin Meng ◽

Yongzhong Wang ◽

Ying Li ◽

...

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Substrate Temperature ◽

Oxygen Partial Pressure ◽

Partial Pressure

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Effect of Oxygen Partial Pressure on the Stoichiometric Composition of Titanium Oxide Films during Magnetron Sputtering

Physics of the Solid State ◽

10.1134/s1063783421100061 ◽

2021 ◽

Author(s):

S. V. Bulyarskiy ◽

G. G. Gusarov ◽

D. A. Koiva ◽

G. A. Rudakov

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Titanium Oxide ◽

Oxide Films ◽

Stoichiometric Composition ◽

Effect Of Oxygen ◽

Titanium Oxide Films

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Study of Photoluminescence Properties of CuxO Thin Films Prepared by Reactive Radio Frequency Magnetron Sputtering

MRS Proceedings ◽

10.1557/opl.2015.596 ◽

2015 ◽

Vol 1792 ◽

Author(s):

Jiantuo Gan ◽

Augustinas Galeckas ◽

Vishnukanthan Venkatachalapathy ◽

Heine N. Riise ◽

Bengt G. Svensson ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Room Temperature ◽

Quartz Substrate ◽

Rf Magnetron Sputtering ◽

Considerable Improvement ◽

Photoluminescence Properties ◽

Radio Frequency Magnetron Sputtering ◽

Room Temperature Photoluminescence

ABSTRACTCuxO thin films have been deposited on a quartz substrate by reactive radio frequency (rf) magnetron sputtering at different target powers Pt (140-190 W) while keeping other growth process parameters fixed. Room-temperature photoluminescence (PL) measurements indicate considerable improvement of crystallinity for the films deposited at Pt>170 W, with most pronounced excitonic features being observed in the film grown using Pt=190 W. These results corroborate well with the surface morphology of the films, which was found more flat, smooth and homogeneous for Pt >170 W films in comparison with those deposited at lower powers.

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