Effect of Oxygen Partial Pressure on the Stoichiometric Composition of Titanium Oxide Films during Magnetron Sputtering

2021 ◽  
Author(s):  
S. V. Bulyarskiy ◽  
G. G. Gusarov ◽  
D. A. Koiva ◽  
G. A. Rudakov
Keyword(s):  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Titanium Oxide ◽  
Oxide Films ◽  
Stoichiometric Composition ◽  
Effect Of Oxygen ◽  
Titanium Oxide Films

The Role of Surface Physical Properties on Blood Compatibility of Titanium Oxide Films Synthesized by Unbalanced Magnetron Sputtering

2005 ◽  
Vol 288-289 ◽  
pp. 311-314 ◽  
Author(s):  
Yong Xiang Leng ◽  
Ping Yang ◽  
Ji Yong Chen ◽  
Lan Xin Xu ◽  
An Sha Zhao ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Physical Properties ◽  
Titanium Oxide ◽  
Sheet Resistance ◽  
Oxygen Pressure ◽  
Carrier Density ◽  
Blood Compatibility ◽  
Oxide Films ◽  
X Ray ◽  
Titanium Oxide Films

Surface modification has shown great potential for improving the hemocompatibility of biomedical materials and devices. In this paper we describe our work on improving blood compatibility with Ti–O thin films prepared by unbalanced DC magnetron sputtering. The structure and surface chemical and physical properties of the films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy (XPS), SEM, sheet resistance tests, and Hall effect measurements. The sheet resistance of the titanium oxide samples increased with oxygen pressure and shows a sharp increase when only TiO2 exists in the films. The band gap, carrier density and sheet resistance of the titanium oxide films synthesized at different oxygen pressure are different. These properties affect blood compatibility significantly. We suggest that the semiconducting nature of n-type Ti–O films with bandgap 3.0~3.2 eV, sheet resistance greater than 1 Ω.cm and carrier density of about 1.17 x 1016cm-2 leads to their excellent blood compatibility.

Structure and Hemocompatibility of Titanium Oxide Films Synthesized by Continuous or Pulsed DC Magnetron Sputtering

2005 ◽  
Vol 288-289 ◽  
pp. 299-302
Author(s):  
Lan Xin Xu ◽  
Yong Xiang Leng ◽  
Hong Fang Zhou ◽  
Y.W. Liu ◽  
Nan Huang
Keyword(s):  
Magnetron Sputtering ◽  
Titanium Oxide ◽  
Oxide Films ◽  
Rutile Phase ◽  
Polar Component ◽  
Interface Tension ◽  
Pulsed Dc ◽  
Sputtering Power ◽  
Lower Ratio ◽  
Titanium Oxide Films

Titanium oxide films were prepared by reactive magnetron sputtering using continuous or pulsed DC sputtering power. The results of the structure and vitro hemocompatibility analyses indicated that non-stoichiometric titanium oxide films possess better hemocompatibility than LTIC and that the hemocompatibility of the titanium oxide films are evidently improved with the increase of rutile phase. This can result from the lower interface tension between titanium oxide films and biological substances and lower ratio of dispersive and polar component of the surface energy.

Highly conductive titanium oxide films by RF magnetron sputtering

2011 ◽  
Vol 8 (9) ◽  
pp. 2742-2745 ◽  
Author(s):  
Koichi Sakaguchi ◽  
Masaki Fukazawa ◽  
Koichi Shimakawa ◽  
Yoshinori Hatanaka
Keyword(s):  
Magnetron Sputtering ◽  
Titanium Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Titanium Oxide Films
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