The studies of RT electrical resistivities of LaNiO3-δthin films by RF magnetron sputtering with different percentage of oxygen partial pressure at various substrate temperatures

2004 ◽  
Author(s):  
X. D. Zhang ◽  
Xiang J. Meng ◽  
Jing L. Sun ◽  
Gen S. Wang ◽  
Tie Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Rf Magnetron Sputtering ◽  
Electrical Resistivities ◽  
Substrate Temperatures

Oxygen Partial Pressure Influenced Structural, Morphological and Optical Properties of Nanocrystalline ZnO Thin Films Formed by RF Magnetron Sputtering

2011 ◽  
Author(s):  
R. Subba Reddy ◽  
A. Sreedhar ◽  
M. Hariprasad Reddy ◽  
P. Kondaiah ◽  
S. Uthanna ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Films

Orientation control of LaNiO3 thin films by RF magnetron sputtering with different oxygen partial pressure

2009 ◽  
Vol 311 (17) ◽  
pp. 4241-4246 ◽  
Author(s):  
Lihui Yang ◽  
Genshui Wang ◽  
Chaoliang Mao ◽  
Yuanyuan Zhang ◽  
Ruihong Liang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Rf Magnetron Sputtering ◽  
Orientation Control

Effects of oxygen partial pressure and substrate temperature on the structure and optical properties of MgxZn1−xO thin films prepared by magnetron sputtering

2011 ◽  
Vol 257 (15) ◽  
pp. 6554-6559 ◽  
Author(s):  
Xinghua Zhang ◽  
Zunming Lu ◽  
Fanbin Meng ◽  
Yongzhong Wang ◽  
Ying Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Oxygen Partial Pressure ◽  
Partial Pressure

scholarly journals Oxygen Partial Pressure Dependence of the Properties of TiO2 Thin Films Deposited by DC Reactive Magnetron Sputtering

2012 ◽  
Vol 32 ◽  
pp. 676-682 ◽  
Author(s):  
M. Horprathum ◽  
P. Eiamchai ◽  
P. Chindaudom ◽  
A. Pokaipisit ◽  
P. Limsuwan
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Pressure Dependence ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Dc Reactive Magnetron Sputtering

Thickness effect on structure and properties of ZAO thin films by RF magnetron sputtering at different substrate temperatures

2011 ◽  
Vol 43 (9) ◽  
pp. 1738-1745 ◽  
Author(s):  
B.L. Zhu ◽  
S.J. Zhu ◽  
J. Wang ◽  
J. Wu ◽  
D.W. Zeng ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Thickness Effect ◽  
Structure And Properties ◽  
Substrate Temperatures
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