Low-temperature (120°C) growth of nanocrystalline silicon films prepared by plasma enhanced chemical vapor deposition from SiCl4/H2 gases: Microstructure characterization

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Microstructure Characterization ◽

Silicon Films ◽

Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2006.01.064 ◽

2006 ◽

Vol 253 (3) ◽

pp. 1198-1204 ◽

Cited By ~ 6

Author(s):

Atif Mossad Ali ◽

Takao Inokuma ◽

Seiichi Hasegawa

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Photo Luminescence ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Luminescence Properties ◽

Plasma enhanced chemical vapor deposition of nanocrystalline silicon films from SiF4-H2-He at low temperature

Thin Solid Films ◽

10.1016/s0040-6090(98)01184-5 ◽

1999 ◽

Vol 337 (1-2) ◽

pp. 59-62 ◽

Cited By ~ 14

Author(s):

G Cicala ◽

P Capezzuto ◽

G Bruno

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Boron Doped p-type Hydrogenated Nanocrystalline Silicon Films Grown by Hot Wire Chemical Vapor Deposition

10.1063/1.3643596 ◽

2011 ◽

Cited By ~ 1

Author(s):

M. R. Pramod ◽

M. M. Kamble ◽

V. S. Waman ◽

A. M. Funde ◽

V. G. Sathe ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Hot Wire ◽

Boron Doped ◽

P Type ◽

Effects of hydrogen on the growth of nanocrystalline silicon films by electron-beam excited plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1287754 ◽

2000 ◽

Vol 88 (11) ◽

pp. 6848-6855 ◽

Cited By ~ 6

Author(s):

Mitsuru Imaizumi ◽

Koji Yamaguchi ◽

Kazuhiko Okitsu ◽

Masafumi Yamaguchi ◽

Tamio Hara ◽

...

Keyword(s):

Electron Beam ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Optical properties of nanocrystalline silicon films deposited by plasma-enhanced chemical vapor deposition

Optical Materials ◽

10.1016/j.optmat.2006.11.042 ◽

2007 ◽

Vol 30 (2) ◽

pp. 238-243 ◽

Cited By ~ 12

Author(s):

Atif Mossad Ali

Keyword(s):

Optical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Visible luminescence from nanocrystalline silicon films produced by plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.116098 ◽

1996 ◽

Vol 68 (10) ◽

pp. 1415-1417 ◽

Cited By ~ 42

Author(s):

Erik Edelberg ◽

Sam Bergh ◽

Ryan Naone ◽

Michael Hall ◽

Eray S. Aydil

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Visible Luminescence ◽

Effects of Addition of SiF4During Growth of Nanocrystalline Silicon Films Deposited at 100°C by Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.6047 ◽

1999 ◽

Vol 38 (Part 1, No. 10) ◽

pp. 6047-6053 ◽

Cited By ~ 13

Author(s):

Atif Mossad Ali ◽

Takao Inokuma ◽

Yoshihiro Kurata ◽

Seiichi Hasegawa

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Structural and Optical Properties of Nanocrystalline Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.169 ◽

2002 ◽

Vol 41 (Part 1, No. 1) ◽

pp. 169-175 ◽

Cited By ~ 5

Author(s):

Atif Mossad Ali ◽

Takao Inokuma ◽

Yoshihiro Kurata ◽

Seiichi Hasegawa

Keyword(s):

Optical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Structural And Optical Properties ◽

Effect of hydrogen dilution on the growth of nanocrystalline silicon films at high temperature by using plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(03)00688-6 ◽

2003 ◽

Vol 437 (1-2) ◽

pp. 68-73 ◽

Cited By ~ 23

Author(s):

A.M Ali ◽

S Hasegawa

Keyword(s):

High Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Hydrogen Dilution ◽

Microstructure and conductivity of large area nanocrystalline silicon films grown by specially designed thermal-assisted chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(02)00503-5 ◽

2002 ◽

Vol 415 (1-2) ◽

pp. 5-9 ◽

Cited By ~ 2

Author(s):

Xi-wen Zhang ◽

Gao-rong Han

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Large Area ◽