Low-temperature (120°C) growth of nanocrystalline silicon films prepared by plasma enhanced chemical vapor deposition from SiCl4/H2 gases: Microstructure characterization

2012 ◽  
Vol 258 (7) ◽  
pp. 3221-3226 ◽  
Author(s):  
L. Zhang ◽  
J.H. Gao ◽  
J.Q. Xiao ◽  
L.S. Wen ◽  
J. Gong ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Microstructure Characterization ◽  
Silicon Films ◽  
Nanocrystalline Silicon Films

Effects of hydrogen on the growth of nanocrystalline silicon films by electron-beam excited plasma chemical vapor deposition

2000 ◽  
Vol 88 (11) ◽  
pp. 6848-6855 ◽  
Author(s):  
Mitsuru Imaizumi ◽  
Koji Yamaguchi ◽  
Kazuhiko Okitsu ◽  
Masafumi Yamaguchi ◽  
Tamio Hara ◽  
...  
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Nanocrystalline Silicon Films

Visible luminescence from nanocrystalline silicon films produced by plasma enhanced chemical vapor deposition

1996 ◽  
Vol 68 (10) ◽  
pp. 1415-1417 ◽  
Author(s):  
Erik Edelberg ◽  
Sam Bergh ◽  
Ryan Naone ◽  
Michael Hall ◽  
Eray S. Aydil
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Visible Luminescence ◽  
Nanocrystalline Silicon Films
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