Structural and Optical Properties of Nanocrystalline Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.169 ◽

2002 ◽

Vol 41 (Part 1, No. 1) ◽

pp. 169-175 ◽

Author(s):

Atif Mossad Ali ◽

Takao Inokuma ◽

Yoshihiro Kurata ◽

Seiichi Hasegawa

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Structural And Optical Properties ◽

Nanocrystalline Silicon Films

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Optical properties of nanocrystalline silicon films deposited by plasma-enhanced chemical vapor deposition

Optical Materials ◽

10.1016/j.optmat.2006.11.042 ◽

2007 ◽

Vol 30 (2) ◽

pp. 238-243 ◽

Author(s):

Atif Mossad Ali

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Nanocrystalline Silicon Films

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Effect of Substrate Temperature on the Structural, Electrical and Optical Properties of Nanocrystalline Silicon Films in Hot-Filament Chemical Vapor Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/28/2/028103 ◽

2011 ◽

Vol 28 (2) ◽

pp. 028103 ◽

Author(s):

Xiao-Song Guo ◽

Shan-Shan Zhang ◽

Zhong Bao ◽

Hong-Liang Zhang ◽

Chang-Cheng Chen ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Substrate Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Electrical And Optical Properties ◽

Hot Filament ◽

Nanocrystalline Silicon Films

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Boron Doped p-type Hydrogenated Nanocrystalline Silicon Films Grown by Hot Wire Chemical Vapor Deposition

10.1063/1.3643596 ◽

2011 ◽

Author(s):

M. R. Pramod ◽

M. M. Kamble ◽

V. S. Waman ◽

A. M. Funde ◽

V. G. Sathe ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Hot Wire ◽

Boron Doped ◽

P Type ◽

Nanocrystalline Silicon Films

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Effects of hydrogen on the growth of nanocrystalline silicon films by electron-beam excited plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1287754 ◽

2000 ◽

Vol 88 (11) ◽

pp. 6848-6855 ◽

Author(s):

Mitsuru Imaizumi ◽

Koji Yamaguchi ◽

Kazuhiko Okitsu ◽

Masafumi Yamaguchi ◽

Tamio Hara ◽

...

Keyword(s):

Electron Beam ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Nanocrystalline Silicon Films

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Low-temperature (120°C) growth of nanocrystalline silicon films prepared by plasma enhanced chemical vapor deposition from SiCl4/H2 gases: Microstructure characterization

Applied Surface Science ◽

10.1016/j.apsusc.2011.11.068 ◽

2012 ◽

Vol 258 (7) ◽

pp. 3221-3226 ◽

Author(s):

L. Zhang ◽

J.H. Gao ◽

J.Q. Xiao ◽

L.S. Wen ◽

J. Gong ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Microstructure Characterization ◽

Silicon Films ◽

Nanocrystalline Silicon Films

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Visible luminescence from nanocrystalline silicon films produced by plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.116098 ◽

1996 ◽

Vol 68 (10) ◽

pp. 1415-1417 ◽

Author(s):

Erik Edelberg ◽

Sam Bergh ◽

Ryan Naone ◽

Michael Hall ◽

Eray S. Aydil

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Visible Luminescence ◽

Nanocrystalline Silicon Films

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Effects of Addition of SiF4During Growth of Nanocrystalline Silicon Films Deposited at 100°C by Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.6047 ◽

1999 ◽

Vol 38 (Part 1, No. 10) ◽

pp. 6047-6053 ◽

Author(s):

Atif Mossad Ali ◽

Takao Inokuma ◽

Yoshihiro Kurata ◽

Seiichi Hasegawa

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Nanocrystalline Silicon Films

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Effect of hydrogen dilution on the growth of nanocrystalline silicon films at high temperature by using plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(03)00688-6 ◽

2003 ◽

Vol 437 (1-2) ◽

pp. 68-73 ◽

Author(s):

A.M Ali ◽

S Hasegawa

Keyword(s):

Chemical Vapor Deposition ◽

High Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Hydrogen Dilution ◽

Nanocrystalline Silicon Films

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Relationship Between Structural and Optical Properties in Polycrystalline Silicon Films Prepared at Low Temperature by Plasma‐Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1838852 ◽

1998 ◽

Vol 145 (10) ◽

pp. 3615-3620 ◽

Author(s):

D. Milovzorov ◽

T. Inokuma ◽

Y. Kurata ◽

S. Hasegawa

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Structural And Optical Properties ◽

Polycrystalline Silicon Films

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Microstructure and conductivity of large area nanocrystalline silicon films grown by specially designed thermal-assisted chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(02)00503-5 ◽

2002 ◽

Vol 415 (1-2) ◽

pp. 5-9 ◽

Author(s):

Xi-wen Zhang ◽

Gao-rong Han

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Nanocrystalline Silicon Films

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