Double layer structure of ZnO thin films deposited by RF-magnetron sputtering on glass substrate

2012 ◽  
Vol 258 (22) ◽  
pp. 8819-8824 ◽  
Author(s):  
C. Besleaga ◽  
G.E. Stan ◽  
A.C. Galca ◽  
L. Ion ◽  
S. Antohe
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Double Layer ◽  
Glass Substrate ◽  
Layer Structure ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Films ◽  
Double Layer Structure

Effects of post-annealing on the structural and nanomechanical properties of Ga-doped ZnO thin films deposited on glass substrate by rf-magnetron sputtering

2011 ◽  
Vol 258 (3) ◽  
pp. 1261-1266 ◽  
Author(s):  
Szu-Ko Wang ◽  
Ting-Chun Lin ◽  
Sheng-Rui Jian ◽  
Jenh-Yih Juang ◽  
Jason S.-C. Jang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Glass Substrate ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Films ◽  
Nanomechanical Properties ◽  
Post Annealing ◽  
Doped Zno

Effects of dopant (Al, Ga, and In) on the characteristics of ZnO thin films prepared by RF magnetron sputtering system

2010 ◽  
Vol 10 (3) ◽  
pp. S463-S467 ◽  
Author(s):  
Kyu Ung Sim ◽  
Seung Wook Shin ◽  
A.V. Moholkar ◽  
Jae Ho Yun ◽  
Jong Ha Moon ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Films ◽  
Sputtering System

Enhanced UV Photon-response of Tin Nano Cluster Loaded- laser Irradiated ZnO Thin film detector

2011 ◽  
Vol 1288 ◽  
Author(s):  
Rashmi Menon ◽  
K. Sreenivas ◽  
Vinay Gupta
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Surface States ◽  
Response Speed ◽  
Rf Magnetron Sputtering ◽  
Fast Response ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
Photo Response

ABSTRACTZinc Oxide (ZnO), II-VI compound semiconductor, is a promising material for ultraviolet (UV) photon sensor applications due to its attractive properties such as good photoconductivity, ease processing at low temperatures and excellent radiation hardness. The rf magnetron sputtering is a suitable deposition technique due to better control over stoichiometry and deposition of uniform film. Studies have shown that the presence of surface defects in ZnO and subsequently their passivation are crucial for enhanced photo-response characteristics, and to obtain the fast response speed. Worldwide efforts are continuing to develop good quality ZnO thin films with novel design structures for realization of an efficient UV photon sensor. In the present work, UV photon sensor is fabricated using a ZnO thin films deposited by rf magnetron sputtering on the corning glass substrate. Photo-response, (Ion/Ioff) of as-grown ZnO film of thickness 100 nm is found to be 3×103 with response time of 90 ms for UV intensity of 140 μW/cm2 (λ = 365 nm). With irradiation on ZnO thin film by pulsed Nd:YAG laser (forth harmonics 266 nm), the sensitivity of the UV sensor is found to enhance. The photo-response increases after laser irradiation to 4x104 with a fast response speed of 35 ms and attributed to the change in surface states and the native defects in the ZnO thin film. Further, enhancement in the ultraviolet (UV) photo-response (8×104) of detector was observed after integrating the nano-scale islands of Sn metal on the surface of laser irradiated ZnO thin film.

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