Deep-injection floating-catalyst chemical vapor deposition to continuously synthesize carbon nanotubes with high aspect ratio and high crystallinity

Carbon ◽  
2021 ◽  
Vol 173 ◽  
pp. 901-909
Author(s):  
Sung-Hyun Lee ◽  
Junbeom Park ◽  
Ji Hong Park ◽  
Dong-Myeong Lee ◽  
Anna Lee ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Aspect Ratio ◽  
Vapor Deposition ◽  
High Aspect Ratio ◽  
Chemical Vapor ◽  
High Crystallinity ◽  
Catalyst Chemical Vapor Deposition

scholarly journals Passivation of high aspect ratio silicon nanowires by using catalytic chemical vapor deposition for radial heterojunction solar cell application

RSC Advances ◽  
2017 ◽  
Vol 7 (71) ◽  
pp. 45101-45106 ◽  
Author(s):  
Gangqiang Dong ◽  
Yurong Zhou ◽  
Hailong Zhang ◽  
Fengzhen Liu ◽  
Guangyi Li ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Aspect Ratio ◽  
Silicon Nanowires ◽  
Vapor Deposition ◽  
High Aspect Ratio ◽  
Chemical Etching ◽  
Chemical Vapor ◽  
Solar Cell Application ◽  
Catalytic Chemical Vapor Deposition ◽  
Metal Assisted Chemical Etching

High aspect ratio silicon nanowires (SiNWs) prepared by metal-assisted chemical etching were passivated by using catalytic chemical vapor deposition (Cat-CVD).

Chirality control for predominant metallic or semiconducting single-walled carbon nanotubes prepared using a mild etchant

2019 ◽  
Vol 55 (92) ◽  
pp. 13888-13891 ◽  
Author(s):  
Sook Young Moon ◽  
Woo Sik Kim
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Walled Carbon Nanotubes ◽  
Chemical Vapor Deposition Method ◽  
Deposition Method ◽  
Chirality Control ◽  
Walled Carbon Nanotubes ◽  
Catalyst Chemical Vapor Deposition

Highly oriented metallic and semiconducting SWCNTs were synthesized with different carrier gas compositions and etchant amounts by the floating catalyst chemical vapor deposition method.

Separate evaluation of multiple film-forming species in chemical vapor deposition of SiC using high aspect-ratio microchannels

2017 ◽  
Vol 56 (6S2) ◽  
pp. 06HE02 ◽  
Author(s):  
Kohei Shima ◽  
Noboru Sato ◽  
Yuichi Funato ◽  
Yasuyuki Fukushima ◽  
Takeshi Momose ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Aspect Ratio ◽  
Vapor Deposition ◽  
High Aspect Ratio ◽  
Chemical Vapor ◽  
Film Forming
Sign in / Sign up

Export Citation Format

Share Document