Enhanced photocatalytic activity of amorphous MoO3 thin films deposited by rf reactive magnetron sputtering

2020 ◽  
Vol 349 ◽  
pp. 150-158 ◽  
Author(s):  
M. Ponce-Mosso ◽  
M. Pérez-González ◽  
P.E. García-Tinoco ◽  
H. Crotte-Ledesma ◽  
M. Morales-Luna ◽  
...  
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

scholarly journals Synthesis And Study The Concentration Effect On The Photocatalytic Activity of Titania Nanoparticles As Anti-Bactria Using Reactive Magnetron Sputtering Technique

2021 ◽  
Author(s):  
Firas J. Al-Maliki ◽  
Maryam A. Al-Rubaiy
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
Single Phase ◽  
Deposition Time ◽  
Weight Fraction ◽  
Mixed Phase ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Abstract In this work, the dc reactive magnetron sputtering technique was used to prepare and deposit nanostructured titanium dioxide (TiO2) thin films on glass substrates. Titanium dioxide thin films of mixed phase (anatase + rutile) and single phase (anatase) were prepared using different gas mixing ratios, and for both of the two phases, they were diagnosed via x-ray diffraction (XRD). It was found that the contents of rutile in mixed phase dependent on the deposition time increased from the ratio of 40% to 46% and 50% as the deposition time increased from 3 hours to 3.30 and 4 hours. The photocatalytic activity of the mixed and single phase TiO2 was measured by kill the bacteria Escherichia coli (E.Coli) under exposure to UV-radiation. It was proven that the photocatalytic activity in the mixed phase (TiO2) gave better results weight fraction is 40% as an antibacterial activity. Based on the obtained results anti-bacterial activity of dioxide titanium nanoparticles was dependent on the concentration and phase of TiO2 and weight fraction of mixed-phase.

Role of carbon in the formation of hard Ge1−xCx thin films by reactive magnetron sputtering

2011 ◽  
Vol 406 (13) ◽  
pp. 2658-2662 ◽  
Author(s):  
Chaoquan Hu ◽  
Liang Qiao ◽  
Hongwei Tian ◽  
Xianyi Lu ◽  
Qing Jiang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Fabrication of MgAl$_{2}$O$_{4}$ Thin Films on Ferromagnetic Heusler Alloy Fe$_{2}$CrSi by Reactive Magnetron Sputtering

2012 ◽  
Vol 51 (2) ◽  
pp. 02BM04 ◽  
Author(s):  
Naoto Fukatani ◽  
Keima Inagaki ◽  
Kenichiro Mari ◽  
Hirohito Fujita ◽  
Tetsuta Miyawaki ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Heusler Alloy ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Electronic properties of Cr1−xAlxN thin films deposited by reactive magnetron sputtering

2002 ◽  
Vol 420-421 ◽  
pp. 312-317 ◽  
Author(s):  
R Sanjinés ◽  
O Banakh ◽  
C Rojas ◽  
P.E Schmid ◽  
F Lévy
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Electronic Properties ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron
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