Characterization of indium tin oxide (ITO) thin films prepared by a sol–gel spin coating process

2011 ◽  
Vol 37 (2) ◽  
pp. 615-619 ◽  
Author(s):  
Hyun Cho ◽  
Young-Hoon Yun
2005 ◽  
Vol 492-493 ◽  
pp. 325-330
Author(s):  
Hyun-Woong Han ◽  
Young Hoon Yun ◽  
Sung Churl Choi

Indium tin oxide (ITO) thin films were deposited on glass substrates via sol-gel spin coating process from a mixed solution of Indium (Ⅲ) acetylacetonate and Tin (Ⅳ) iso-propoxide. Then, ITO thin films were fired at 500°C, and then annealed at 500°C for 30 min with the sequential annealing process; VacuumN2Ar/H2, N2Ar/H2 and Ar/H2 gas. The effects of the different annealing processes on the surface morphologies and sheet resistance of ITO thin films were investigated. Sheet resistance values of ITO thin films treated under VacuumN2Ar/H2, N2Ar/H2 and Ar/H2 annealing process were 1.25 kohm/sq., 3.18 kohm/sq. and 4.92 kohm/sq., respectively. Actually, the sequential atmosphere gases and non-oxidizing gas, which were used in annealing process influenced the microstructural features or surface morphologies of ITO thin films: grain size and surface roughness. Thus, it was presumed that the sequential annealing condition influenced the densification behavior in the microstructural evolution of ITO thin films.


2011 ◽  
Vol 343-344 ◽  
pp. 116-123
Author(s):  
Yu Ming Peng ◽  
Yan Kuin Su ◽  
Cheng Jye Chu ◽  
Ru Yuan Yang ◽  
Ruei Ming Huang

In this paper, the indium tin oxide (ITO) thin films were prepared by a sol-gel spin coating method and then annealed under different temperatures (400, 500 and 550°C) in a mixture atmosphere of 3.75% H2 with 96.25% N2 gases. The microstructure, optical and electrical properties of the prepared films were investigated and discussed. The XRD patterns of the ITO thin films indicated the main peak of the (222) plane and showed a high degree of crystallinity with an increase of the annealing temperature. In addition, due to the pores existing in the prepared films, the optical and electrical properties of the prepared films are degraded through the sol-gel process. Thus, the best transmittance of 70.0 %in the visible wavelength region and the lowest resistivity of about 1.1×10-2 Ω-cm were obtained when the prepared film was annealed at 550°C.


2006 ◽  
Vol 45 ◽  
pp. 2355-2361 ◽  
Author(s):  
Patcharaporn Itthivisit ◽  
Samart Kongtaweelert ◽  
Sakda Traisak

Indium tin oxide (In-Sn-O, ITO) system is typical widely used as transparent electrodes for display devices, transparent coatings for solar energy heat mirrors and window films in p-n heterojunction solar cells because of their’s unique properties of a high visible transparency, good electrical conductivity, and excellent adhesion to the substrate, stable chemical property and easy patterning ability. In this paper, preparation and characterization of Indium tin oxide (ITO) thin films were studied by deposited dip coating process onto glass substrate. The mixing of various molar ratio of indium chloride (InCl3) and tin chloride (SnCl2.2H2O), (In:Sn mole ratio , 9:1, 7:3, 1:1), in acetylacetone were used as the starting solution. The suitable In:Sn ratio for one stoichiometry indium tin oxide (In2Sn2O7) compound were studied via hydrolysis process of mixed solution. The result of thermal gravimetric analysis were used to supported and corrected of calcining temperature. The precipitated powders were calcined at 500 0C and 600 0C. The result of XRD spectrum indicated that the calcined 9:1 powders at 6000C was show the highest stoichiometry of indium tin oxide (In2Sn2O7) compound with a polycrystalline cubic structure. The ITO thin films were studied by deposited dip coating process onto glass substrate with 20 layers at 600 0C for 1 hour. The optical properties, band gap energy and microstructure of ITO thin films were investigated by UV-vis spectrophotometer and Scaning Electron Microscope (SEM) respectively. The result of SEM was shown highly homogeneous surface and average grain size 20 nm with 95% transmittance which corresponding to XRD results. The calculated energy gap of ITO film was 3.40 eV.


2020 ◽  
Vol 19 ◽  
pp. 100482 ◽  
Author(s):  
Radhia Messemeche ◽  
Hanane Saidi ◽  
Abdallah Attaf ◽  
Youcef Benkhetta ◽  
Saadia Chala ◽  
...  

2014 ◽  
Vol 925 ◽  
pp. 416-419
Author(s):  
Mohd Zainizan Sahdan ◽  
Sharul Ashikin Kamaruddin ◽  
Kah Yoong Chan ◽  
Uda Hashim ◽  
Nayan Nafarizal ◽  
...  

Aluminium (Al) doped zinc oxide (ZnO) has been considered as one of the promising transparent conducting oxide for wide applications in electronic devices. In this investigation, sol-gel spin coating process were employed to fabricate Al:ZnO on glass coated with indium tin oxide (ITO) substrate. In order to expose the effects of aluminium concentration on the structural and electrical properties of the ZnO films, different Al concentrations (1 at.%, 3 at.% and 5 at.%) were used. A field emission scanning electron microscope (FESEM) and a two point probe were employed to examined the material properties of the Al:ZnO films. Through the FESEM results, the Al:ZnO films show different morphologies behaviour with increasing the Al concentrations. Besides, the electrical conductivity was increased by increasing the dopant source and the lowest resistivity was obtained at 5 at.%. In general, the Al concentration exerts strong influence on the ZnO films properties. Keywords: Transparent conducting oxide, X-ray diffraction, sol gel


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