Morphology and growth mechanism of amorphous silicon carbide sputtered on anodic aluminum template by radio frequency magnetron sputtering

Amorphous Silicon Carbide ◽

Anodic Aluminum

Spectroscopic ellipsometry study of non-hydrogenated fully amorphous silicon films deposited by room-temperature radio-frequency magnetron sputtering on glass: Influence of the argon pressure

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2020.120305 ◽

2020 ◽

Vol 547 ◽

pp. 120305 ◽

Cited By ~ 1

Author(s):

E. Márquez ◽

E. Blanco ◽

C. García-Vázquez ◽

J.M. Díaz ◽

E. Saugar

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Room Temperature ◽

Radio Frequency Magnetron Sputtering

Silicon Films ◽

Argon Pressure ◽

Thin Films of Amorphous Silicon-Germanium Alloys Prepared by Radio-Frequency Magnetron Sputtering

Journal of The Electrochemical Society ◽

10.1149/1.1393201 ◽

2000 ◽

Vol 147 (1) ◽

pp. 363 ◽

Cited By ~ 3

Author(s):

Toshiro Maruyama ◽

Hajime Fujii

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Amorphous Silicon ◽

Silicon Germanium ◽

Amorphous Silicon Germanium ◽

Silicon Germanium Alloys

An investigation on the effect of high partial pressure of hydrogen on the nanocrystalline structure of silicon carbide thin films prepared by radio-frequency magnetron sputtering

Spectrochimica Acta Part A Molecular and Biomolecular Spectroscopy ◽

10.1016/j.saa.2014.10.029 ◽

2015 ◽

Vol 136 ◽

pp. 1409-1417 ◽

Cited By ~ 8

Author(s):

Mohsen Daouahi ◽

Mourad Omri ◽

Abdul Ghani Yousseph Kerm ◽

Faisal Abdulaziz Al-Agel ◽

Najeh Rekik

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Partial Pressure ◽

Nanocrystalline Structure ◽

High Partial Pressure

Thin Films of Amorphous Silicon-Carbon Alloy Prepared by Radio-Frequency Magnetron Sputtering

Journal of The Electrochemical Society ◽

10.1149/1.1416506 ◽

2001 ◽

Vol 148 (12) ◽

pp. G717 ◽

Cited By ~ 3

Author(s):

Toshiro Maruyama ◽

Hiroyuki Sudoh

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Amorphous Silicon ◽

Silicon Carbon

Determination of the sputter rate variation pattern of a silicon carbide target for radio frequency magnetron sputtering using optical transmission measurements

Materials Science and Engineering B ◽

10.1016/j.mseb.2010.03.012 ◽

2010 ◽

Vol 174 (1-3) ◽

pp. 127-131 ◽

Cited By ~ 3

Author(s):

G. Gálvez de la Puente ◽

J.A. Guerra Torres ◽

O. Erlenbach ◽

M. Steidl ◽

R. Weingärtner ◽

...

Keyword(s):

Silicon Carbide ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Optical Transmission ◽

Rate Variation ◽

Variation Pattern ◽

Transmission Measurements

Thin Films of Amorphous Silicon‐Tin Alloy Prepared by Radio‐Frequency Magnetron Sputtering

Journal of The Electrochemical Society ◽

10.1149/1.1838191 ◽

1997 ◽

Vol 144 (12) ◽

pp. 4350-4353 ◽

Cited By ~ 7

Author(s):

Toshiro Maruyama ◽

Hisao Akagi

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Amorphous Silicon ◽

Radio Frequency Magnetron Sputtering

Effect of Plused Negative Bias on Nucleation and Morphological Evolution of ZnO Films Deposited by Reactive Radio-frequency Magnetron Sputtering

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2009.00602 ◽

2009 ◽

Vol 24 (3) ◽

pp. 602-606 ◽

Cited By ~ 1

Author(s):

Wei-Jia FU ◽

Zhi-Wen LIU ◽

Jian-Feng GU ◽

Ming LIU ◽

Qing-Yu ZHANG

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Morphological Evolution ◽

Radio Frequency Magnetron Sputtering

Zno Films ◽

Negative Bias ◽

Effect of sputtering power on the properties of SiO2 films grown by radio frequency magnetron sputtering at room temperature

Optical and Quantum Electronics ◽

10.1007/s11082-020-02639-4 ◽

2021 ◽

Vol 53 (1) ◽

Author(s):

Changjiang Zhao ◽

Leran Zhao ◽

Juncheng Liu ◽

Zhigang Liu ◽

Yan Chen

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Room Temperature ◽

Sio2 Films ◽

Sputtering Power

Mechanical, tribological, anti-corrosion and anti-glass sticking properties of high-entropy TaNbSiZrCr carbide coatings prepared using radio-frequency magnetron sputtering

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2021.124741 ◽

2021 ◽

pp. 124741

Author(s):

W.H. Kao ◽

Y.L. Su ◽

J.H. Horng ◽

W.C. Wu

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

High Entropy ◽

Carbide Coatings

Nickel telluride vertically aligned thin film by radio-frequency magnetron sputtering for hydrogen evolution reaction

APL Materials ◽

10.1063/5.0024588 ◽

2020 ◽

Vol 8 (12) ◽

pp. 121104

Author(s):

Jeonghyeon Oh ◽

Ho Jun Park ◽

Arindam Bala ◽

Hee-Soo Kim ◽

Na Liu ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Hydrogen Evolution ◽

Hydrogen Evolution Reaction ◽

Vertically Aligned