Photoelectron spectroscopy and photochemistry of tetracyanoethylene radical anion in the gas phase

The AlnC5- (n = 1-5) clusters were detected in the gas-phase and were investigated by mass-selected anion photoelectron spectroscopy. The structures of AlnC5-/0 (n = 1-5) were explored by theoretical...

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Dry Etching Performance and Gas-Phase Parameters of C6F12O + Ar Plasma in Comparison with CF4 + Ar

Materials ◽

10.3390/ma14071595 ◽

2021 ◽

Vol 14 (7) ◽

pp. 1595

Author(s):

Nomin Lim ◽

Yeon Sik Choi ◽

Alexander Efremov ◽

Kwang-Ho Kwon

Keyword(s):

Gas Phase ◽

Photoelectron Spectroscopy ◽

Reactive Ion Etching ◽

Research Work ◽

Optical Emission ◽

Plasma Parameters ◽

Ion Etching ◽

Ar Plasma ◽

Ar Gas ◽

Etching Selectivity

This research work deals with the comparative study of C6F12O + Ar and CF4 + Ar gas chemistries in respect to Si and SiO2 reactive-ion etching processes in a low power regime. Despite uncertain applicability of C6F12O as the fluorine-containing etchant gas, it is interesting because of the liquid (at room temperature) nature and weaker environmental impact (lower global warming potential). The combination of several experimental techniques (double Langmuir probe, optical emission spectroscopy, X-ray photoelectron spectroscopy) allowed one (a) to compare performances of given gas systems in respect to the reactive-ion etching of Si and SiO2; and (b) to associate the features of corresponding etching kinetics with those for gas-phase plasma parameters. It was found that both gas systems exhibit (a) similar changes in ion energy flux and F atom flux with variations on input RF power and gas pressure; (b) quite close polymerization abilities; and (c) identical behaviors of Si and SiO2 etching rates, as determined by the neutral-flux-limited regime of ion-assisted chemical reaction. Principal features of C6F12O + Ar plasma are only lower absolute etching rates (mainly due to the lower density and flux of F atoms) as well as some limitations in SiO2/Si etching selectivity.

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Reactions of the benzyne radical anion in the gas phase, the acidity of the phenyl radical, and the heat of formation of o-benzyne

Journal of the American Chemical Society ◽

10.1021/ja00016a001 ◽

1991 ◽

Vol 113 (16) ◽

pp. 5923-5931 ◽

Cited By ~ 48

Author(s):

Yili Guo ◽

Joseph J. Grabowski

Keyword(s):

Gas Phase ◽

Radical Anion ◽

Heat Of Formation ◽

Phenyl Radical

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Nitrosyl Isocyanate (ONNCO): Gas-Phase Generation and a HeI Photoelectron Spectroscopy Study

Inorganic Chemistry ◽

10.1021/ic051349w ◽

2005 ◽

Vol 44 (25) ◽

pp. 9283-9287 ◽

Cited By ~ 25

Author(s):

Xiaoqing Zeng ◽

Maofa Ge ◽

Zheng Sun ◽

Dianxun Wang

Keyword(s):

Gas Phase ◽

Photoelectron Spectroscopy ◽

Spectroscopy Study

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Application of photoelectron spectroscopy to molecular properties. 45. Reactivity of [(alkylthio)methylene]ketenes in the gas phase and photoelectron spectra of thiophen-3(2H)-ones

The Journal of Organic Chemistry ◽

10.1021/jo00010a049 ◽

1991 ◽

Vol 56 (10) ◽

pp. 3445-3447 ◽

Cited By ~ 6

Author(s):

F. Chuburu ◽

S. Lacombe ◽

Genevieve Pfister-Guillouzo ◽

A. Ben Cheik ◽

J. Chuche ◽

...

Keyword(s):

Gas Phase ◽

Photoelectron Spectroscopy ◽

Molecular Properties ◽

Photoelectron Spectra

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DEVELOPMENT OF A CONICAL ENERGY ANALYZER FOR ANGLE-RESOLVED PHOTOELECTRON SPECTROSCOPY

Surface Review and Letters ◽

10.1142/s0218625x02002683 ◽

2002 ◽

Vol 09 (01) ◽

pp. 583-586

Author(s):

KOTA IWASAKI ◽

KOICHIRO MITSUKE

Keyword(s):

Gas Phase ◽

Energy Resolution ◽

Photoelectron Spectroscopy ◽

Angular Resolution ◽

Photoelectron Spectra ◽

Sensitive Detector ◽

Energy Analyzer ◽

Position Sensitive ◽

Pass Energy ◽

Helium Discharge

A new angle-resolving electron energy analyzer composed of a conical electrostatic prism and a position-sensitive detector was developed for gas phase photoelectron spectroscopy. The performance of the analyzer has been tested by measuring photoelectron spectra of Ar using a helium discharge lamp. The angular resolution of 3° was achieved at the pass energy E of 5.6 eV. The best energy resolution was ΔE/E = 0.043 at E = 1.4 eV .

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Gas-Phase Tautomerism in the Triazoles and Tetrazoles: A Study by Photoelectron Spectroscopy and ab Initio Molecular Orbital Calculations

Zeitschrift für Naturforschung A ◽

10.1515/zna-1981-1121 ◽

1981 ◽

Vol 36 (11) ◽

pp. 1246-1252 ◽

Cited By ~ 45

Author(s):

Michael H. Palmer ◽

Isobel Simpson ◽

J. Ross Wheeler

Keyword(s):

Ab Initio ◽

Gas Phase ◽

Molecular Orbital ◽

Photoelectron Spectroscopy ◽

Relative Stability ◽

Photoelectron Spectra ◽

Equilibrium Geometry ◽

Molecular Orbital Calculations ◽

Methyl Derivatives

The photoelectron spectra of the tautomeric 1,2,3,- and 1,2,4-triazole and 1,2,3,4-tetrazole systems have been compared with the corresponding N-methyl derivatives. The dominant tautomers in the gas phase have been identified as 2 H-1,2,3-triazole, 1 H-1,2,4-triazole and 2H-tetrazole.Full optimisation of the equilibrium geometry by ab initio molecular orbital methods leads to the same conclusions, for relative stability of the tautomers in each of the triazoles, but the calculations wrongly predict the tetrazole tautomerism.

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