Effect of ammonia treatment on laser-induced damage of nano-porous silica film

AbstractPeriodic 2-dimensional (2-D) hexagonal and the disordered pore structure silica films have been developed using nonionic surfactants as the templates. The pore structure was controlled by the static electrical interaction between the micelle of the surfactant and the silica oligomer. No X-ray diffraction peaks were observed for the disordered mesoporous silica films, while the pore diameters of 2.0-4.0 nm could be measured by small angle X-ray scattering spectroscopy. By comparing the properties of the 2-D hexagonal and the disordered porous silica films which have the same porosity, it is found that the disordered porous silica film has advantages in terms of the dielectric constant and Young's modulus as well as the hardness. The disordered porous silica film is more suitable for the interlayer dielectrics for ULSI.

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Gas-Sensitive Optical Absorption of Ultrafine Silver Particles Dispersed in a Porous Silica Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.27.l164 ◽

1988 ◽

Vol 27 (Part 2, No. 2) ◽

pp. L164-L166 ◽

Cited By ~ 10

Author(s):

Akihisa Yanase ◽

Hiroshi Komiyama ◽

Kazunobu Tanaka

Keyword(s):

Optical Absorption ◽

Porous Silica ◽

Silica Film ◽

Silver Particles ◽

Porous Silica Film

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The roles of hydrophobic group on the surface of ultra low dielectric constant porous silica film during thermal treatment

Thin Solid Films ◽

10.1016/j.tsf.2007.03.028 ◽

2007 ◽

Vol 515 (18) ◽

pp. 7275-7280 ◽

Cited By ~ 16

Author(s):

Jen-Tsung Luo ◽

Wen-Fa Wu ◽

Hua-Chiang Wen ◽

Ben-Zu Wan ◽

Yu-Ming Chang ◽

...

Keyword(s):

Dielectric Constant ◽

Thermal Treatment ◽

Porous Silica ◽

Silica Film ◽

Low Dielectric Constant ◽

Hydrophobic Group ◽

Low Dielectric ◽

Porous Silica Film

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A novel fabrication of meso-porous silica film by sol-gol of TEOS

Journal of Zhejiang University SCIENCE A ◽

10.1631/jzus.2004.0422 ◽

2004 ◽

Vol 5 (4) ◽

pp. 422-427 ◽

Cited By ~ 4

Author(s):

Ming-zhi Yin ◽

Xi Yao ◽

Liang-ying Zhang

Keyword(s):

Porous Silica ◽

Silica Film ◽

Porous Silica Film

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Porogen concentration and its desorbing temperature dependence in porous silica film incorporated with ethylene groups

Materials Science and Engineering B ◽

10.1016/j.mseb.2004.12.031 ◽

2005 ◽

Vol 118 (1-3) ◽

pp. 250-252 ◽

Cited By ~ 2

Author(s):

Yasutaka Uchida ◽

Yoshito Ito ◽

Koichi Ishida

Keyword(s):

Temperature Dependence ◽

Porous Silica ◽

Silica Film ◽

Porous Silica Film

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Synthesis of hierarchically porous silica film with controllable surface wettability

International Nano Letters ◽

10.1007/s40089-014-0102-y ◽

2014 ◽

Vol 4 (1) ◽

Cited By ~ 17

Author(s):

Shengyang Tao ◽

Yuchao Wang

Keyword(s):

Porous Silica ◽

Silica Film ◽

Surface Wettability ◽

Hierarchically Porous ◽

Porous Silica Film

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Structure control of periodic porous silica film for low-k application

10.7567/ssdm.2002.b-2-2 ◽

2002 ◽

Author(s):

Kazuhiro Yamada ◽

Yoshiaki Oku ◽

Nobuhiro Hata ◽

Shozo Takada ◽

Takamaro Kikkawa

Keyword(s):

Porous Silica ◽

Silica Film ◽

Structure Control ◽

Porous Silica Film ◽

Low K

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A Novel Organosiloxane Vapor Annealing Process for Improving Elastic Modulus of Porous Low-k Films

MRS Proceedings ◽

10.1557/proc-812-f6.2 ◽

2004 ◽

Vol 812 ◽

Cited By ~ 11

Author(s):

Kazuo Kohmura ◽

Shunsuke Oike ◽

Masami Murakami ◽

Hirofumi Tanaka ◽

Syozo Takada ◽

...

Keyword(s):

Elastic Modulus ◽

Mechanical Strength ◽

Porous Silica ◽

Thermal Desorption Spectroscopy ◽

Silica Film ◽

Low Dielectric ◽

Porous Silica Film ◽

Vapor Annealing ◽

Ft Ir ◽

Low K

AbstractA novel organosiloxane-vapor-annealing method has been developed for improving the mechanical strength of porous silica films with a low dielectric constant. Treatment of a porous silica film with 1,3,5,7-tetramethylcyclotetrasiloxane (TMCTS) under atmospheric nitrogen above 350 °C significantly enhanced the mechanical strength (i.e., elastic modulus and hardness) of the film. Results of Fourier transform infrared spectroscopy (FT-IR) and thermal desorption spectroscopy (TDS) suggested the formation of cross-linked poly(TMCTS) network on the porous silica internal wall surfaces by the TMCTS treatment. Such TMCTS cross-linked network is thought to enhance the mechanical strength of the low-k film.

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