Effect of deposition conditions on optical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method

Optik ◽  
2018 ◽  
Vol 172 ◽  
pp. 107-116 ◽  
Author(s):  
A.S. Grenadyorov ◽  
K.V. Oskomov ◽  
А.А. Solovyev
2009 ◽  
Vol 113 (43) ◽  
pp. 18527-18530 ◽  
Author(s):  
C. H. Zang ◽  
D. M. Zhang ◽  
C. J. Tang ◽  
S. J. Fang ◽  
Z. J. Zong ◽  
...  

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