Effect of deposition conditions on optical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method
2008 ◽
2014 ◽
Vol 53
(5S1)
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pp. 05FB17
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2009 ◽
Vol 113
(43)
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pp. 18527-18530
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2019 ◽
Vol 11
(8)
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pp. 1168-1173
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2005 ◽
Vol 23
(4)
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pp. 875-879
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1991 ◽
Vol 30
(Part 2, No. 11B)
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pp. L1931-L1934
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2018 ◽
Vol 349
◽
pp. 547-555
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2012 ◽
Vol 358
(3)
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pp. 577-582
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