Preparation of spray dried submicron particles: Part A – Particle generation by aerosol conditioning

2018 ◽  
Vol 548 (1) ◽  
pp. 423-430 ◽  
Author(s):  
Ramona Strob ◽  
Adrian Dobrowolski ◽  
Gerhard Schaldach ◽  
Peter Walzel ◽  
Markus Thommes
2018 ◽  
Vol 29 (12) ◽  
pp. 2920-2927 ◽  
Author(s):  
Ramona Strob ◽  
Adrian Dobrowolski ◽  
Damian Pieloth ◽  
Gerhard Schaldach ◽  
Helmut Wiggers ◽  
...  

2018 ◽  
Vol 548 (1) ◽  
pp. 237-243 ◽  
Author(s):  
Adrian Dobrowolski ◽  
Ramona Strob ◽  
Jessica Nietfeld ◽  
Damian Pieloth ◽  
Helmut Wiggers ◽  
...  

2018 ◽  
Vol 249 ◽  
pp. 609-616 ◽  
Author(s):  
Naqueeb Anzar ◽  
Mohd. Aamir Mirza ◽  
Khalid Anwer ◽  
Tahir Khuroo ◽  
Abdullah S. Alshetaili ◽  
...  

2020 ◽  
Vol 585 ◽  
pp. 119429 ◽  
Author(s):  
Márcia Camponogara Fontana ◽  
João Victor Laureano ◽  
Betielli Forgearini ◽  
Juliana dos Santos ◽  
Adriana Raffin Pohlmann ◽  
...  

Author(s):  
Marylyn Bennett-Lilley ◽  
Thomas T.H. Fu ◽  
David D. Yin ◽  
R. Allen Bowling

Chemical Vapor Deposition (CVD) tungsten metallization is used to increase VLSI device performance due to its low resistivity, and improved reliability over other metallization schemes. Because of its conformal nature as a blanket film, CVD-W has been adapted to multiple levels of metal which increases circuit density. It has been used to fabricate 16 MBIT DRAM technology in a manufacturing environment, and is the metallization for 64 MBIT DRAM technology currently under development. In this work, we investigate some sources of contamination. One possible source of contamination is impurities in the feed tungsten hexafluoride (WF6) gas. Another is particle generation from the various reactor components. Another generation source is homogeneous particle generation of particles from the WF6 gas itself. The purpose of this work is to investigate and analyze CVD-W process-generated particles, and establish a particle characterization methodology.


Author(s):  
C.M. Teng ◽  
T.F. Kelly ◽  
J.P. Zhang ◽  
H.M. Lin ◽  
Y.W. Kim

Spherical submicron particles of materials produced by electrohydrodynamic (EHD) atomization have been used to study a variety of materials processes including nucleation of alternative crystallization phases in iron-nickel and nickel-chromium alloys, amorphous solidification in submicron droplets of pure metals, and quasi-crystal formation in nickel-chromium alloys. Some experiments on pure nickel, nickel oxide single crystals, the nickel/nickel(II) oxide interface, and grain boundaries in nickel monoxide have been performed by STEM. For these latter studies, HREM is the most direct approach to obtain particle crystal structures at the atomic level. Grain boundaries in nickel oxide have also been investigated by HREM. In this paper, we present preliminary results of HREM observations of NiO growth on submicron spheres of pure nickel.Small particles of pure nickel were prepared by EHD atomization. For the study of pure nickel, 0.5 mm diameter pure nickel wire (99.9975%) is sprayed directly in the EHD process. The liquid droplets solidify in free-flight through a vacuum chamber operated at about 10-7 torr.


2009 ◽  
pp. 090624002829090
Author(s):  
Tristan P. Learoyd ◽  
Jane L. Burrows ◽  
Eddie French ◽  
Peter C. Seville

Planta Medica ◽  
2013 ◽  
Vol 79 (13) ◽  
Author(s):  
TL Medeiros ◽  
CB Oliveira ◽  
DF Cortés-Rojas ◽  
ML Brandão ◽  
VF Andrade Neto ◽  
...  

Planta Medica ◽  
2013 ◽  
Vol 79 (13) ◽  
Author(s):  
MR Fernandes ◽  
CR Souza ◽  
ML Martinez ◽  
WP Oliveira

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