Oxidation behavior of γ/Mo2Ni3Si ternary metal silicide alloy

2008 ◽  
Vol 457 (1-2) ◽  
pp. 239-243 ◽  
Author(s):  
Y.W. Xu ◽  
H.M. Wang
2006 ◽  
Vol 14 (7) ◽  
pp. 750-758 ◽  
Author(s):  
Y.L. Fang ◽  
H.B. Tang ◽  
H.M. Wang

2011 ◽  
Vol 704-705 ◽  
pp. 1068-1072
Author(s):  
Yong Liang Gui ◽  
Xue Jing Qi ◽  
Chun Yan Song

A noval wear resistant Moss-toughened Mo2Ni3Si metal silicide alloys was designed and manufactured with the commercial Mo, Ni and Si powders. Wear resistance of the alloys was evaluated under dry-sliding wear test condition at room temperature. Results show that the alloys have excellent wear resistance and tribological compatibility coupling with conventional metallic materials due to the high hardness and strong atomic bonds of the ternary metal silicide Mo2Ni3Si with MgZn2 type Laves crystal structure.


Author(s):  
J. Hefter

Semiconductor-metal composites, formed by the eutectic solidification of silicon and a metal silicide have been under investigation for some time for a number of electronic device applications. This composite system is comprised of a silicon matrix containing extended metal-silicide rod-shaped structures aligned in parallel throughout the material. The average diameter of such a rod in a typical system is about 1 μm. Thus, characterization of the rod morphology by electron microscope methods is necessitated.The types of morphometric information that may be obtained from such microscopic studies coupled with image processing are (i) the area fraction of rods in the matrix, (ii) the average rod diameter, (iii) an average circularity (roundness), and (iv) the number density (Nd;rods/cm2). To acquire electron images of these materials, a digital image processing system (Tracor Northern 5500/5600) attached to a JEOL JXA-840 analytical SEM has been used.


2012 ◽  
Vol 50 (8) ◽  
pp. 575-582 ◽  
Author(s):  
Dong Bok Lee ◽  
Trinh Wan Trung ◽  
Sun Kyu Kim ◽  
Min Jung Kim ◽  
Seul Ki Kim ◽  
...  

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