Growth of gallium nitride on silicon by molecular beam epitaxy incorporating a chromium nitride interlayer

2012 ◽  
Vol 511 (1) ◽  
pp. 1-4 ◽  
Author(s):  
Kuang-Wei Liu ◽  
Sheng-Joue Young ◽  
Shoou-Jinn Chang ◽  
Tao-Hung Hsueh ◽  
Hung Hung ◽  
...  
1999 ◽  
Vol 572 ◽  
Author(s):  
C. M. Lueng ◽  
H. L. W. Chan ◽  
W. K. Fong ◽  
C. Surya ◽  
C. L. Choy

ABSTRACTAluminum nitride (AlN) and gallium nitride (GaN) thin films have potential uses in high temperature, high frequency (e.g. microwave) acoustic devices. In this work, the piezoelectric coefficients of wurtzite AlN and GaN/AlN composite film grown on silicon substrates by molecular beam epitaxy were measured by a Mach-Zehnder type heterodyne interferometer. The effects of the substrate on the measured coefficients are discussed.


2006 ◽  
Vol 100 (8) ◽  
pp. 083516 ◽  
Author(s):  
Muhammad B. Haider ◽  
Rong Yang ◽  
Costel Constantin ◽  
Erdong Lu ◽  
Arthur R. Smith ◽  
...  

2003 ◽  
Vol 37 (7) ◽  
pp. 838-842 ◽  
Author(s):  
A. A. Vorob’ev ◽  
V. V. Korablev ◽  
S. Yu. Karpov

2009 ◽  
Vol 43 (3) ◽  
pp. 403-409 ◽  
Author(s):  
I. A. Bobrovnikova ◽  
I. V. Ivonin ◽  
V. A. Novikov ◽  
V. V. Preobrazhenskii

2004 ◽  
Vol 234 (1-4) ◽  
pp. 445-450 ◽  
Author(s):  
S Vézian ◽  
F Natali ◽  
F Semond ◽  
J Massies

1998 ◽  
Vol 187 (3-4) ◽  
pp. 397-401 ◽  
Author(s):  
S.Yu Karpov ◽  
Yu.N Makarov ◽  
M.S Ramm ◽  
R.A Talalaev

2004 ◽  
Vol 264 (1-3) ◽  
pp. 184-191 ◽  
Author(s):  
S Sienz ◽  
J.W Gerlach ◽  
T Höche ◽  
A Sidorenko ◽  
T.G Mayerhöfer ◽  
...  

2004 ◽  
Vol 458 (1-2) ◽  
pp. 63-66 ◽  
Author(s):  
S. Sienz ◽  
J.W. Gerlach ◽  
T. Höche ◽  
A. Sidorenko ◽  
B. Rauschenbach

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