Investigation of Cu2ZnSnS4 thin film with preannealing process and ZnS buffer layer prepared by magnetron sputtering deposition

2021 ◽  
pp. 161015
Author(s):  
Wei-Sheng Liu ◽  
Chien-Sheng Huang ◽  
Shih-Yuan Chen ◽  
Ming-Yuan Lee ◽  
Hsing-Chun Kuo
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Buffer Layer ◽  
Sputtering Deposition ◽  
Cu2znsns4 Thin Film

Growth of Highly (112) Oriented Cu2ZnSnS4 Thin Film on Sapphire Substrate by Radio Frequency Magnetron Sputtering

2014 ◽  
Vol 1640 ◽  
Author(s):  
Ning Song ◽  
Xiaojing Hao ◽  
Binesh Puthen-Veettil ◽  
Shujuan Huang ◽  
Martin A Green
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Structural Investigation ◽  
Rf Magnetron Sputtering ◽  
Structural Quality ◽  
Radio Frequency Magnetron Sputtering ◽  
Deposition Parameters ◽  
Cu2znsns4 Thin Film ◽  
Czts Thin Films

ABSTRACTFor structural investigation, highly (112) oriented tetragonal Cu2ZnSnS4 (CZTS) thin films on hexagonal sapphire (0001) single crystal substrates were obtained by radio frequency (RF) magnetron sputtering. The influences of the deposition parameters, such as substrate temperature (Tsub) and working Ar pressure (PAr) on the chemical composition and structural properties of as deposited CZTS films were investigated. The film sputtered at 500°C has the only orientation of (112), also, it bears the best structural quality with pure CZTS phase and an estimated band gap of 1.51eV.

Nanostructured phothocatalytic TiO2 thin film fabricated by magnetron sputtering on glass

2012 ◽  
Vol 05 ◽  
pp. 661-669 ◽  
Author(s):  
BAHRAM ABDOLLAHI NEJAND ◽  
SOHRAB SANJABI ◽  
VAHID AHMADI
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Buffer Layer ◽  
Photocatalytic Property ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
X Ray Diffraction ◽  
Soda Lime Glass Substrate ◽  
Layer Deposition ◽  
Photocatalytic Activities

TiO 2 thin film was deposited by a DC reactive magnetron sputtering on ZnO /soda-lime glass substrate and single crystal SiO 2 below 200 °C. ZnO layer was used as a buffer layer. Deposition was performed at Ar + O 2 gas mixture with a pressure of 1.0 Pa and oxygen with a constant pressure of 0.2 Pa. The TiO 2 / ZnO thicknesses were approximately 1000 nm and 80 nm, respectively. As-deposited films were annealed at 400 °C. The structure and morphology of deposited layers were evaluated by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The transmittance of the films was measured using ultraviolet–visible light (UV–vis) spectrophotometer. Photocatalytic activities of the samples were evaluated by the degradation of 2-propanol. The microstructure of annealed films was anatase, having improved photocatalytic activity. The surface grain size of TiO 2 thin film after annealing was found about 25-35 nm and crystal size was approximately 8 nm. By using ZnO thin film as buffer layer, the photocatalytic property of TiO 2 films was improved.

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