Low temperature preparation of ZnO by a nearby vaporizing chemical vapor deposition method

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Temperature Preparation

Low-Temperature Photoluminescence of Sb-doped ZnO Nanowires Synthesized on Sb-coated Si Substrate by Chemical Vapor Deposition Method

ZnO Nanocrystals and Allied Materials - Springer Series in Materials Science ◽

10.1007/978-81-322-1160-0_16 ◽

2013 ◽

pp. 331-339

Author(s):

K. Sakai ◽

K. Ishikura ◽

A. Fukuyama ◽

I. A. Palani ◽

M. S. Ramachandra Rao ◽

...

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Zno Nanowires ◽

Deposition Method ◽

Si Substrate ◽

Doped Zno ◽

Low Temperature Photoluminescence

Low-Temperature Preparation of Oxygen- and Carbon-Free Silicon and Silicon-Germanium Surfaces for Silicon and Silicon-Germanium Epitaxial Growth by Rapid Thermal Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1394118 ◽

2000 ◽

Vol 147 (12) ◽

pp. 4652 ◽

Cited By ~ 30

Author(s):

M. S. Carroll ◽

J. C. Sturm ◽

M. Yang

Keyword(s):

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Silicon Germanium ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Free Silicon ◽

Temperature Preparation

Novel plasma chemical vapor deposition method of carbon nanotubes at low temperature for field emission display application

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00475-1 ◽

2001 ◽

Vol 10 (2) ◽

pp. 248-253 ◽

Cited By ~ 19

Author(s):

Suk Jae Chung ◽

Sung Hoon Lim ◽

Choong Hun Lee ◽

Jin Jang

Keyword(s):

Carbon Nanotubes ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Field Emission Display ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Low Temperature Growth of Cu2ZnSnS4 Thin Films By Solution-Based Mist Chemical Vapor Deposition Method

ECS Meeting Abstracts ◽

10.1149/ma2016-02/15/1386 ◽

2016 ◽

Keyword(s):

Thin Films ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Temperature Growth ◽

Low Temperature Growth

Step-Coverage Characteristics of Silicon-Dioxide Films Formed by a New Low-Temperature Chemical-Vapor-Deposition Method

10.1143/jjap.36.l993 ◽

1997 ◽

Vol 36 (Part 2, No. 8A) ◽

pp. L993-L995 ◽

Cited By ~ 3

Author(s):

Yasutaka Uchida ◽

Shu Takei ◽

Masakiyo Matsumura

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Step Coverage ◽

Silicon Dioxide Films

Low Temperature Preparation of TiO2 Thin Films by Plasma-Enhanced Chemical Vapor Deposition

Journal of the Ceramic Society of Japan ◽

10.2109/jcersj.101.514 ◽

1993 ◽

Vol 101 (1173) ◽

pp. 514-517 ◽

Cited By ~ 14

Author(s):

Yoshimasa KUMASHIRO ◽

Yoshiki KINOSHITA ◽

Yoichi TAKAOKA ◽

Sadao MURASAWA

Keyword(s):

Thin Films ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Tio2 Thin Films ◽

Temperature Preparation

Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma

10.1143/jjap.22.l210 ◽

1983 ◽

Vol 22 (Part 2, No. 4) ◽

pp. L210-L212 ◽

Cited By ~ 289

Author(s):

Seitaro Matsuo ◽

Mikiho Kiuchi

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Deposition Method ◽

Resonance Plasma

Very-Low-Temperature Preparation of Poly-Si Films by Plasma Chemical Vapor Deposition Using SiF4/SiH4/H2Gases

10.1143/jjap.30.l779 ◽

1991 ◽

Vol 30 (Part 2, No. 5A) ◽

pp. L779-L782 ◽

Cited By ~ 19

Author(s):

Mikio Mohri ◽

Hiroaki Kakinuma ◽

Masaaki Sakamoto ◽

Hideo Sawai

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Si Films ◽

Temperature Preparation ◽

Very Low Temperature

Low Temperature Deposition of Silicon Nitride by the Catalytic Chemical Vapor Deposition Method

10.1143/jjap.28.2157 ◽

1989 ◽

Vol 28 (Part 1, No. 10) ◽

pp. 2157-2161 ◽

Cited By ~ 32

Author(s):

Hideki Matsumura

Keyword(s):

Silicon Nitride ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Catalytic Chemical Vapor Deposition ◽

Low Temperature Deposition ◽

Temperature Deposition

Low-temperature growth and n-type doping of CdTe by the remote-plasma-assisted metalorganic chemical vapor deposition method

Vacuum ◽

10.1016/s0042-207x(00)00333-x ◽

2000 ◽

Vol 59 (2-3) ◽

pp. 678-685 ◽

Cited By ~ 4

Author(s):

Madan Niraula ◽

Daisuke Mochizuki ◽

Toru Aoki ◽

Yoichiro Nakanishi ◽

Yoshinori Hatanaka

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Remote Plasma ◽

Temperature Growth ◽

Metalorganic Chemical