Nondestructive characterization of surface resistance for copper(II) phthalocyanine thin films using a near-field scanning microwave microscope

2005 ◽  
Vol 275 (1-2) ◽  
pp. e1863-e1867
Author(s):  
Miehwa Park ◽  
Hyunjun Yoo ◽  
Eunju Lim ◽  
Jae-yong Kim ◽  
Kiejin Lee ◽  
...  
2005 ◽  
Vol 275 (1-2) ◽  
pp. e1869-e1873
Author(s):  
Hyunjun Yoo ◽  
Miewha Kim ◽  
Hyun Kim ◽  
Jongil Yang ◽  
Songhui Kim ◽  
...  

2004 ◽  
Vol 233 (1-4) ◽  
pp. 213-218 ◽  
Author(s):  
Miehwa Park ◽  
Hyunjun Yoo ◽  
Sunil Yun ◽  
Eunju Lim ◽  
Kiejin Lee ◽  
...  

2006 ◽  
Vol 321-323 ◽  
pp. 1457-1460 ◽  
Author(s):  
Hyun Jun Yoo ◽  
Jong Chel Kim ◽  
Arsen Babajayan ◽  
Song Hui Kim ◽  
Kie Jin Lee

We observed the surface resistance of metal thin films by a nondestructive characterization method using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system. To demonstrate the ability of local microwave characterization, the surface resistance dependence of the metallic thin films has been mapped nondestructively.


2006 ◽  
Vol 499 (1-2) ◽  
pp. 318-321 ◽  
Author(s):  
Miehwa Park ◽  
Hyunjun Yoo ◽  
Hyungun Yoo ◽  
Seungwook Na ◽  
Songhui Kim ◽  
...  

2012 ◽  
Vol 83 (8) ◽  
pp. 083702 ◽  
Author(s):  
J. C. Weber ◽  
J. B. Schlager ◽  
N. A. Sanford ◽  
A. Imtiaz ◽  
T. M. Wallis ◽  
...  

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