Nondestructive characterization of various thin films using a near-field scanning millimeter-wave microscope

2005 ◽  
Vol 275 (1-2) ◽  
pp. e1869-e1873
Author(s):  
Hyunjun Yoo ◽  
Miewha Kim ◽  
Hyun Kim ◽  
Jongil Yang ◽  
Songhui Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Millimeter Wave ◽  
Near Field ◽  
Near Field Scanning ◽  
Nondestructive Characterization

Nondestructive and Non-Contact Characterization Technique for Metal Thin Films Using a Near-Field Microwave Microprobe

2006 ◽  
Vol 321-323 ◽  
pp. 1457-1460 ◽  
Author(s):  
Hyun Jun Yoo ◽  
Jong Chel Kim ◽  
Arsen Babajayan ◽  
Song Hui Kim ◽  
Kie Jin Lee
Keyword(s):  
Thin Films ◽  
Surface Resistance ◽  
Near Field ◽  
Regulation System ◽  
Metallic Thin Films ◽  
Metal Thin Films ◽  
Microwave Characterization ◽  
Distance Regulation ◽  
Near Field Scanning ◽  
Nondestructive Characterization

We observed the surface resistance of metal thin films by a nondestructive characterization method using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system. To demonstrate the ability of local microwave characterization, the surface resistance dependence of the metallic thin films has been mapped nondestructively.

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