Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide
2006 ◽
Vol 26
(8)
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pp. 1325-1335
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2016 ◽
Vol 4
(45)
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pp. 10731-10739
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Keyword(s):
2009 ◽
Vol 362
(9)
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pp. 3069-3072
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2015 ◽
Vol 127
(3)
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pp. 499-507
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Keyword(s):