Fabrication of copper–zinc oxide composite thin films from single source precursor by aerosol assisted chemical vapour deposition

Polyhedron ◽  
2008 ◽  
Vol 27 (16) ◽  
pp. 3337-3342 ◽  
Author(s):  
Muhammad Shahid ◽  
Muhammad Mazhar ◽  
Mohammad A. Malik ◽  
Paul O’ Brien ◽  
James Raftery
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Oxide Composite ◽  
Single Source Precursor ◽  
Copper Zinc ◽  
Copper Zinc Oxide

scholarly journals [Ge(TenBu)4] – a single source precursor for the chemical vapour deposition of germanium telluride thin films

2019 ◽  
Vol 48 (1) ◽  
pp. 117-124 ◽  
Author(s):  
Samantha L. Hawken ◽  
Ruomeng Huang ◽  
C. H. (Kees) de Groot ◽  
Andrew L. Hector ◽  
Marek Jura ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Germanium Telluride ◽  
Single Source Precursor

Reaction of activated germanium with nBu2Te2 in THF solution was shown to be more effective for the preparation of the germanium(iv) tellurolate compound, [Ge(TenBu)4], than reaction of GeCl4 with LiTenBu in THF.

Homoleptic zirconium amidates: single source precursors for the aerosol-assisted chemical vapour deposition of ZrO2

2016 ◽  
Vol 4 (45) ◽  
pp. 10731-10739 ◽  
Author(s):  
Amanda L. Catherall ◽  
Michael S. Hill ◽  
Andrew L. Johnson ◽  
Gabriele Kociok-Köhn ◽  
Mary F. Mahon
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursors ◽  
Single Source Precursor ◽  
Original Family

We report the development of a true single source precursor for the growth of zirconia thin films by aerosol-assisted chemical vapour deposition using an original family of zirconium(iv) amidate derivatives.

scholarly journals Bis(piperidinedithiocarbamato)pyridinecadmium(ii) as a single-source precursor for the synthesis of CdS nanoparticles and aerosol-assisted chemical vapour deposition (AACVD) of CdS thin films

2014 ◽  
Vol 38 (12) ◽  
pp. 6073-6080 ◽  
Author(s):  
Sixberth Mlowe ◽  
David J. Lewis ◽  
M. Azad Malik ◽  
James Raftery ◽  
Egid B. Mubofu ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Cds Nanoparticles ◽  
Single Source ◽  
Dithiocarbamate Complex ◽  
Single Source Precursor ◽  
Cds Thin Films

The pyridine adduct of a cadmium piperidine dithiocarbamate complex was used to deposit CdS thin films and for the synthesis of CdS nanoparticles.

ZnFe2O4 thin films from a single source precursor by aerosol assisted chemical vapour deposition

2010 ◽  
Vol 518 (14) ◽  
pp. 3664-3668 ◽  
Author(s):  
Asif Ali Tahir ◽  
K.G.U. Wijayantha ◽  
Muhammad Mazhar ◽  
Vickie McKee
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursor

Phase pure Ni3S2 and NiS from bis(N′-ethyl-N-piperazinylcarbodithioato-S,S′)–nickel(ii) via solvent thermolysis and aerosol assisted chemical vapour deposition

2018 ◽  
Vol 42 (8) ◽  
pp. 6203-6209 ◽  
Author(s):  
Charles Gervas ◽  
Sixberth Mlowe ◽  
Matthew P. Akerman ◽  
Neerish Revaprasadu
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Nickel Sulfide ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursor ◽  
Phase Pure

We report the structure of a triclinic bis(N′-ethyl-N-piperazinylcarbodithioato-S,S′)–nickel(ii) complex and its use as a single source precursor for the synthesis of nickel sulfide thin films and nanoparticles.

Chemical vapour deposition of II–VI semiconductor thin films using M[(TePiPr2)2N]2(M = Cd, Hg) as single-source precursors

2006 ◽  
Vol 16 (10) ◽  
pp. 966-969 ◽  
Author(s):  
Shivram S. Garje ◽  
Jamie S. Ritch ◽  
Dana J. Eisler ◽  
Mohammad Afzaal ◽  
Paul O'Brien ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursors ◽  
Semiconductor Thin Films

scholarly journals Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films

2018 ◽  
Vol 47 (31) ◽  
pp. 10536-10543 ◽  
Author(s):  
Kelly Rees ◽  
Emanuela Lorusso ◽  
Samuel D. Cosham ◽  
Alexander N. Kulak ◽  
Geoffrey Hyett
Keyword(s):  
Thin Films ◽  
Phase Space ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursors

Combining single-source precursors in aerosol assisted CVD allows control of the composition of mixed anion titanium oxynitride thin films.

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