scholarly journals A simulation model to characterize the photolithography process of a semiconductor wafer fabrication

2004 ◽  
Vol 155-156 ◽  
pp. 2071-2079 ◽  
Author(s):  
A. Arisha ◽  
P. Young ◽  
M. El Baradie
2010 ◽  
Vol 44-47 ◽  
pp. 18-22
Author(s):  
Bing Hai Zhou

Photolithography is usually the bottleneck process with the most expensive equipment in a semiconductor wafer fabrication system. To improve the performances of the photolithography area with dynamic combination rules, a method of Kohonen neural network (KNN)–based performance improvements is proposed. First, a dynamic scheduling framework based on a KNN model and scheduling rules is proposed. A KNN-based sample learning algorithm for improving the performances is presented. Finally, to demonstrate the validity and feasibility of the proposed method, data from a real wafer fabrication system are used to simulate the proposed method. Results of simulation experiments indicate that the proposed method can be used to improve a complex wafer photolithography performance.


2010 ◽  
Vol 52 (11) ◽  
pp. 1082-1097 ◽  
Author(s):  
John D. Boice ◽  
Donald E. Marano ◽  
Heather M. Munro ◽  
Bandana K. Chadda ◽  
Lisa B. Signorello ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document