Disorder-induced nucleation in the nanocrystalline silicon film growth from chlorinated materials by rf plasma-enhanced chemical vapor deposition

2004 ◽  
Vol 338-340 ◽  
pp. 115-118 ◽  
Author(s):  
Hajime Shirai ◽  
Tetsuji Ito ◽  
Yoshie Ikeda
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Silicon Film ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Rf Plasma

Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2Mixture

2003 ◽  
Vol 42 (Part 2, No. 10A) ◽  
pp. L1191-L1194 ◽  
Author(s):  
Hajime Shirai ◽  
Yasuhiro Seri ◽  
Haijun Jia ◽  
Ken-ichi Kurosaki
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Rf Plasma

Growth Rate and Crystallinity of Nanocrystalline Silicon Film Grown by Electron Beam Excited Plasma Chemical Vapor Deposition

2000 ◽  
Vol 39 (Part 1, No. 10) ◽  
pp. 6035-6036 ◽  
Author(s):  
Tadashi Ito ◽  
Mitsuru Imaizumi ◽  
Koji Yamaguchi ◽  
Kazuhiko Okitsu ◽  
Ichiro Konomi ◽  
...  
Keyword(s):  
Growth Rate ◽  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Film ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition
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