Effect of Ar+Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System
2000 ◽
Vol 39
(Part 1, No. 11)
◽
pp. 6404-6409
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1989 ◽
Vol 50
(C5)
◽
pp. C5-667-C5-672
2007 ◽
Vol 154
(5)
◽
pp. G122
◽
2008 ◽
Vol 69
(2-3)
◽
pp. 648-652
◽
1992 ◽
Vol 31
(Part 1, No. 8)
◽
pp. 2588-2591
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1994 ◽
Vol 33
(Part 1, No. 7B)
◽
pp. 4373-4376
◽
2001 ◽
Vol 40
(Part 1, No. 12)
◽
pp. 6862-6867
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2009 ◽
Vol 11
(5)
◽
pp. 569-575
◽
1993 ◽
pp. 345-350
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