Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2Mixture

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.l1191 ◽

2003 ◽

Vol 42 (Part 2, No. 10A) ◽

pp. L1191-L1194 ◽

Author(s):

Hajime Shirai ◽

Yasuhiro Seri ◽

Haijun Jia ◽

Ken-ichi Kurosaki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

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Disorder-induced nucleation in the nanocrystalline silicon film growth from chlorinated materials by rf plasma-enhanced chemical vapor deposition

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2004.02.033 ◽

2004 ◽

Vol 338-340 ◽

pp. 115-118 ◽

Author(s):

Hajime Shirai ◽

Tetsuji Ito ◽

Yoshie Ikeda

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Film Growth ◽

Silicon Film ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

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Formation of Self-Assembled Nanocrystalline Silicon Dots by SiCl4/H2 RF Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.l1214 ◽

2001 ◽

Vol 40 (Part 2, No. 11B) ◽

pp. L1214-L1216 ◽

Author(s):

Yukihiro Fujimura ◽

Sughoan Jung ◽

Hajime Shirai

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Rf Plasma ◽

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Role of chlorine in the nanocrystalline silicon film formation by rf plasma-enhanced chemical vapor deposition of chlorinated materials

Thin Solid Films ◽

10.1016/j.tsf.2003.12.021 ◽

2004 ◽

Vol 457 (1) ◽

pp. 90-96 ◽

Author(s):

Hajime Shirai

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Film Formation ◽

Silicon Film ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

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Role of chlorine in the nanocrystalline silicon film formation by rf plasma-enhanced chemical vapor deposition of chlorinated materials

Thin Solid Films ◽

10.1016/s0040-6090(03)01941-2 ◽

2004 ◽

Author(s):

H Shirai

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Film Formation ◽

Silicon Film ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

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Formation of nanocrystalline silicon dots from chlorinated materials by RF plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(02)00005-6 ◽

2002 ◽

Vol 407 (1-2) ◽

pp. 12-17 ◽

Author(s):

Hajime Shirai ◽

Yukihiro Fujimura ◽

Sughoan Jung

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

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Synthesis of novel p-type nanocrystalline silicon from SiH2Cl2 and SiCl4 by rf plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.08.023 ◽

2006 ◽

Vol 506-507 ◽

pp. 38-44 ◽

Author(s):

Yali Li ◽

Yoshie Ikeda ◽

Yasutake Toyoshima ◽

Hajime Shirai

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Rf Plasma ◽

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Boron Doped p-type Hydrogenated Nanocrystalline Silicon Films Grown by Hot Wire Chemical Vapor Deposition

10.1063/1.3643596 ◽

2011 ◽

Author(s):

M. R. Pramod ◽

M. M. Kamble ◽

V. S. Waman ◽

A. M. Funde ◽

V. G. Sathe ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Hot Wire ◽

Boron Doped ◽

P Type ◽

Nanocrystalline Silicon Films

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Characterization of Undoped, N- and P-Type Hydrogenated Nanocrystalline Silicon Carbide Films Deposited by Hot-Wire Chemical Vapor Deposition at Low Temperatures

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.1415 ◽

2007 ◽

Vol 46 (4A) ◽

pp. 1415-1426 ◽

Author(s):

Shinsuke Miyajima ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Nanocrystalline Silicon Carbide ◽

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Phenomenological model of nanocrystalline silicon film formation by plasma-enhanced chemical vapor deposition

Optoelectronics Instrumentation and Data Processing ◽

10.3103/s8756699009040062 ◽

2009 ◽

Vol 45 (4) ◽

pp. 322-327

Author(s):

P. L. Novikov ◽

A. Le Donne ◽

S. Cereda ◽

L. Miglio ◽

S. Pizzini ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Phenomenological Model ◽

Vapor Deposition ◽

Film Formation ◽

Silicon Film ◽

Chemical Vapor ◽

Nanocrystalline Silicon

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Effects of hydrogen on the growth of nanocrystalline silicon films by electron-beam excited plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1287754 ◽

2000 ◽

Vol 88 (11) ◽

pp. 6848-6855 ◽

Author(s):

Mitsuru Imaizumi ◽

Koji Yamaguchi ◽

Kazuhiko Okitsu ◽

Masafumi Yamaguchi ◽

Tamio Hara ◽

...

Keyword(s):

Electron Beam ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Nanocrystalline Silicon Films

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