Effect of pre-deposited carbon layer on the formation of carbon nitride nanostructures prepared by radio-frequency plasma enhanced chemical vapour deposition

Carbon Nitride ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Layer ◽

Radio Frequency Plasma ◽

Amorphous hollow carbon spheres synthesized using radio frequency plasma-enhanced chemical vapour deposition

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/41/19/195504 ◽

2008 ◽

Vol 41 (19) ◽

pp. 195504 ◽

Cited By ~ 8

Author(s):

G M Yang ◽

Q Xu ◽

H W Tian ◽

X Wang ◽

W T Zheng

Keyword(s):

Radio Frequency ◽

Vapour Deposition ◽

Chemical Vapour ◽

Radio Frequency Plasma ◽

Carbon Spheres ◽

Frequency Plasma ◽

Hollow Carbon ◽

Hollow Carbon Spheres

Titanium(IV) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method

Thin Solid Films ◽

10.1016/j.tsf.2019.137697 ◽

2020 ◽

Vol 693 ◽

pp. 137697

Author(s):

Anna Jedrzejczak ◽

Damian Batory ◽

Milena Prowizor ◽

Magdalena Dominik ◽

Mateusz Smietana ◽

...

Keyword(s):

Radio Frequency ◽

Vapour Deposition ◽

Chemical Vapour ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma ◽

Chemical Vapour Deposition Method ◽

Carbon Based ◽

Oxygen Atoms

Dielectric substrate self-bias and plasma confinement in two-dimensional scanning radio frequency plasma-enhanced chemical vapour deposition

Vacuum ◽

10.1016/j.vacuum.2006.05.014 ◽

2006 ◽

Vol 81 (4) ◽

pp. 441-445

Author(s):

Y. Yin ◽

Y.Q. Pan ◽

L. Hang ◽

M.M.M. Bilek ◽

D. McKenzie ◽

...

Keyword(s):

Radio Frequency ◽

Vapour Deposition ◽

Chemical Vapour ◽

Dielectric Substrate ◽

Radio Frequency Plasma ◽

Two Dimensional ◽

Plasma Confinement ◽

Self Bias ◽

Low-pressure chemical vapour deposition of diamond films in a radio-frequency-plasma-assisted hot-filament reactor

Diamond and Related Materials ◽

10.1016/s0925-9635(98)00226-x ◽

1998 ◽

Vol 7 (10) ◽

pp. 1526-1533 ◽

Cited By ~ 4

Author(s):

M.P. Pai ◽

D.V. Musale ◽

S.T. Kshirsagar

Keyword(s):

Radio Frequency ◽

Vapour Deposition ◽

Diamond Films ◽

Chemical Vapour ◽

Low Pressure ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Pressure Chemical ◽

Hot Filament

Synthesis of graphene on a polycrystalline Co film by radio-frequency plasma-enhanced chemical vapour deposition

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/43/45/455402 ◽

2010 ◽

Vol 43 (45) ◽

pp. 455402 ◽

Cited By ~ 50

Author(s):

S M Wang ◽

Y H Pei ◽

X Wang ◽

H Wang ◽

Q N Meng ◽

...

Keyword(s):

Radio Frequency ◽

Vapour Deposition ◽

Chemical Vapour ◽

Radio Frequency Plasma ◽

Silica coating of aluminium nitride particles by radio-frequency plasma chemical vapour deposition

Journal of Materials Science Letters ◽

10.1007/bf02352915 ◽

1994 ◽

Vol 13 (1) ◽

pp. 43-45 ◽

Cited By ~ 9

Author(s):

K. Tsugeki ◽

S. Yan ◽

H. Maeda ◽

K. Kusakabe ◽

S. Morooka

Keyword(s):

Radio Frequency ◽

Vapour Deposition ◽

Chemical Vapour ◽

Silica Coating ◽

Aluminium Nitride ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Frequency Plasma ◽

Plasma Chemical Vapour Deposition

A kinetic model for radio frequency plasma-activated chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(78)90331-0 ◽

1978 ◽

Vol 48 (1) ◽

pp. 57-65 ◽

Cited By ~ 16

Author(s):

Guy Turban ◽

Yves Catherine

Keyword(s):

Kinetic Model ◽

Radio Frequency ◽

Vapour Deposition ◽

Chemical Vapour ◽

Radio Frequency Plasma ◽

Studies of thermal stability of a-C:H:Si coatings produced by radio-frequency plasma assisted chemical vapour deposition (RF-PACVD) method

INŻYNIERIA MATERIAŁOWA ◽

10.15199/28.2016.4.5 ◽

2016 ◽

Vol 1 (4) ◽

pp. 32-37

Author(s):

Damian Batory

Keyword(s):

Thermal Stability ◽

Radio Frequency ◽

Vapour Deposition ◽

Chemical Vapour ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Thermal Stability Of

Pulsed-radio frequency plasma enhanced chemical vapour deposition of low temperature silicon nitride for thin film transistors

Thin Solid Films ◽

10.1016/j.tsf.2012.03.010 ◽

2012 ◽

Vol 520 (15) ◽

pp. 4831-4834 ◽

Cited By ~ 8

Author(s):

Arman Ahnood ◽

Yuji Suzuki ◽

Arun Madan ◽

Arokia Nathan

Keyword(s):

Thin Film ◽

Silicon Nitride ◽

Low Temperature ◽

Radio Frequency ◽

Thin Film Transistors ◽

Vapour Deposition ◽

Chemical Vapour ◽

Radio Frequency Plasma ◽

Radio-frequency plasma-enhanced chemical vapour deposition of carbon films on AISI 316LVM steel: Formation of a transition layer and metal whiskers, and their influence on coating properties

Thin Solid Films ◽

10.1016/j.tsf.2018.05.036 ◽

2018 ◽

Vol 659 ◽

pp. 16-23 ◽

Cited By ~ 2

Author(s):

Krzysztof Jastrzębski ◽

Jacek Grabarczyk

Keyword(s):

Radio Frequency ◽

Transition Layer ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Coating Properties ◽