scholarly journals Glass-ceramic sealants and steel interconnects: accelerated interfacial stability and reactivity tests at high temperature

2021 ◽  
pp. 110259
Author(s):  
A. Drewniak ◽  
D. Koszelow ◽  
P. Błaszczak ◽  
K. Górnicka ◽  
K. Jurak ◽  
...  
Keyword(s):  
High Temperature ◽  
Glass Ceramic ◽  
Interfacial Stability

Crystallization sequence of an A1N-Y2O3-SiO2 glass-ceramic

1986 ◽  
Vol 44 ◽  
pp. 446-447
Author(s):  
T.R. Dinger ◽  
G. Thomas
Keyword(s):  
High Temperature ◽  
Glass Ceramic ◽  
Crystallization Behavior ◽  
High Stress ◽  
Crystallization Sequence ◽  
Sio2 Glass ◽  
Structural Applications ◽  
Ceramic Precursors

The use of Si3N4, alloys for high temperature, high stress structural applications has prompted numerous studies of the oxynitride glasses which exist as intergranular phases in their microstructures. Oxynitride glasses have been investigated recently in their bulk form in order to understand their crystallization behavior for subsequent Si3N4 applications and to investigate their worth as glass-ceramic precursors. This research investigates the crystallization sequence of a glass having a normalized composition of Y26Si30Al11 ON11 and lying in the A1N-Y2O3-SiO2 section of the Y-Si-Al-O-N system. Such glasses exist as intergranular phases in the technologically important Y2O3/Al2O3-fluxed Si3N4 alloys.

Study on the interfacial stability of p-type Ti/Ce Fe Co4Sb12 thermoelectric joints at high temperature

2016 ◽  
Vol 671 ◽  
pp. 238-244 ◽  
Author(s):  
Ming Gu ◽  
Xugui Xia ◽  
Xiangyang Huang ◽  
Shengqiang Bai ◽  
Xiaoya Li ◽  
...  
Keyword(s):  
High Temperature ◽  
Interfacial Stability ◽  
P Type

Behavior of the refractive index of lithium disilicate glass ceramic processed at high pressure and high temperature

2012 ◽  
Vol 34 (5) ◽  
pp. 826-831 ◽  
Author(s):  
Silvio Buchner ◽  
Marcelo Barbalho Pereira ◽  
Naira Maria Balzaretti
Keyword(s):  
High Pressure ◽  
Refractive Index ◽  
High Temperature ◽  
Glass Ceramic ◽  
Lithium Disilicate

High Temperature Stability of SiC/Ti Interface

2011 ◽  
Vol 685 ◽  
pp. 340-344 ◽  
Author(s):  
Tung Wai Leo Ngai ◽  
Chang Xu Hu ◽  
Wei Zheng ◽  
Heng Xie ◽  
Yuan Yuan Li
Keyword(s):  
Thermal Stability ◽  
High Temperature ◽  
Composite Materials ◽  
Temperature Stability ◽  
Diffusion Path ◽  
Interfacial Stability ◽  
Diffusion Couples ◽  
High Temperature Stability ◽  
High Temperature Structural Material ◽  
Thermal Stability Of

Ti, SiC and their composite materials have been widely used as high temperature structural material. The knowledge of interfacial stability between SiC and Ti is vital in high temperature applications. In this study, SiC/Ti diffusion couples were prepared to investigate the interfacial reactions between SiC and Ti at 1273 K. Phase forming sequence, microstructure and thermal stability of SiC/Ti interface were studied. It was indicated that after annealed at 1273 K for 10 days, 4 reaction layers were formed at the SiC/Ti interface. The diffusion path between SiC and Ti is SiC/Ti3SiC2/Ti5Si3/Ti5Si3+TiC/Ti3Si/Ti. As the annealing time prolong, the thicknesses of these reaction layers increased.

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