Effect of annealing time on chemical vapor deposition growth of 3D graphene for photoelectrochemical water splitting

Water Splitting ◽

Annealing Time ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth ◽

3D Graphene

Chemical Vapor Deposition of FeOCl Nanosheet Arrays and Their Conversion to Porous α-Fe2O3Photoanodes for Photoelectrochemical Water Splitting

Chemistry - A European Journal ◽

10.1002/chem.201503394 ◽

2015 ◽

Vol 21 (50) ◽

pp. 18024-18028 ◽

Cited By ~ 10

Author(s):

Chong Wu Wang ◽

Shuang Yang ◽

Hai Bo Jiang ◽

Huagui Yang

Keyword(s):

Water Splitting ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanosheet Arrays

Chemical vapor deposition of amorphous molybdenum sulphide on black phosphorus for photoelectrochemical water splitting

Journal of Material Science and Technology ◽

10.1016/j.jmst.2020.07.010 ◽

2021 ◽

Vol 68 ◽

pp. 1-7

Author(s):

Yuanmei Xu ◽

Xiaoqin Zhang ◽

Zhihong Chen ◽

Krzysztof Kempa ◽

Xin Wang ◽

...

Keyword(s):

Water Splitting ◽

Vapor Deposition ◽

Chemical Vapor ◽

Black Phosphorus ◽

Molybdenum Sulphide

Aerosol-assisted chemical vapor deposition of metal oxide thin films for photoelectrochemical water splitting

International Journal of Hydrogen Energy ◽

10.1016/j.ijhydene.2014.11.131 ◽

2015 ◽

Vol 40 (5) ◽

pp. 2115-2131 ◽

Cited By ~ 23

Author(s):

S.N. Ariffin ◽

H.N. Lim ◽

Z.A. Talib ◽

A. Pandikumar ◽

N.M. Huang

Keyword(s):

Thin Films ◽

Metal Oxide ◽

Water Splitting ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metal Oxide Thin Films

Corrigendum to “Aerosol-assisted chemical vapor deposition of metal oxide thin films for photoelectrochemical water splitting” [Int J Hydrogen Energy 40 (2015) 2115–2131]

International Journal of Hydrogen Energy ◽

10.1016/j.ijhydene.2015.01.139 ◽

2015 ◽

Vol 40 (10) ◽

pp. 4035

Author(s):

S.N. Ariffin ◽

H.N. Lim ◽

Z.A. Talib ◽

A. Pandikumar ◽

N.M. Huang

Keyword(s):

Thin Films ◽

Metal Oxide ◽

Water Splitting ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hydrogen Energy ◽

Oxide Thin Films ◽

Metal Oxide Thin Films

Branched and unbranched ZnO nanorods grown via chemical vapor deposition for photoelectrochemical water-splitting applications

Ceramics International ◽

10.1016/j.ceramint.2020.12.119 ◽

2020 ◽

Author(s):

S. Swathi ◽

E. Sunil Babu ◽

R. Yuvakkumar ◽

G. Ravi ◽

Arunachalam Chinnathambi ◽

...

Keyword(s):

Photoelectrochemical Water Splitting

Water Splitting ◽

Vapor Deposition ◽

Zno Nanorods ◽

Chemical Vapor ◽

Frontispiece: Chemical Vapor Deposition of FeOCl Nanosheet Arrays and Their Conversion to Porous α-Fe2O3Photoanodes for Photoelectrochemical Water Splitting

Chemistry - A European Journal ◽

10.1002/chem.201585061 ◽

2015 ◽

Vol 21 (50) ◽

pp. n/a-n/a

Author(s):

Chong Wu Wang ◽

Shuang Yang ◽

Hai Bo Jiang ◽

Huagui Yang

Keyword(s):

Water Splitting ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanosheet Arrays

Chemical vapor deposition growth and characterization of AlGaN nanowires

JOURNAL OF SHENZHEN UNIVERSITY SCIENCE AND ENGINEERING ◽

10.3724/sp.j.1249.2015.06638 ◽

2015 ◽

Vol 32 (6) ◽

pp. 638

Author(s):

Xingmin Cai ◽

Xiaoqiang Su ◽

Fan Ye ◽

Huan Wang ◽

Guangxing Liang ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth

Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates

Applied Physics Express ◽

10.35848/1882-0786/ab9a8f ◽

2020 ◽

Vol 13 (7) ◽

pp. 075505

Author(s):

Tomohiro Yamaguchi ◽

Hiroki Nagai ◽

Takanori Kiguchi ◽

Nao Wakabayashi ◽

Takuto Igawa ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth ◽

Α Al2o3

High yield production of 3D graphene powders by thermal chemical vapor deposition and application as highly efficient conductive additive of lithium ion battery electrodes

Carbon ◽

10.1016/j.carbon.2021.01.128 ◽

2021 ◽

Vol 176 ◽

pp. 21-30

Author(s):

Xixi Ji ◽

Yongbiao Mu ◽

Jingbing Liang ◽

Tao Jiang ◽

Jie Zeng ◽

...

Keyword(s):

Vapor Deposition ◽

Lithium Ion ◽

Chemical Vapor ◽

High Yield ◽

3D Graphene ◽

Thermal Chemical Vapor Deposition ◽

Conductive Additive ◽

Yield Production ◽

High Yield Production

Metal Organic Chemical Vapor Deposition Growth of High Spectral Quality Site-Controlled InAs Quantum Dots UsingIn situPatterning

Applied Physics Express ◽

10.1143/apex.4.112001 ◽

2011 ◽

Vol 4 (11) ◽

pp. 112001 ◽

Cited By ~ 5

Author(s):

Stephane Faure ◽

Masao Nishioka ◽

Satomi Ishida ◽

Denis Guimard ◽

Yasuhiko Arakawa

Keyword(s):

Quantum Dots ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Spectral Quality ◽

Chemical Vapor Deposition Growth ◽

Inas Quantum Dots ◽

Metal Organic ◽

Organic Chemical Vapor Deposition