Development of UHV pulsed laser deposition set-up for in-situ photoelectron spectroscopic study at ARPES beamline, Indus-1 synchrotron radiation source, India

Author(s):  
Mangla Nand ◽  
Yogesh Kumar ◽  
Ashutosh Dwivedi ◽  
Shilpa Tripathi ◽  
Babita ◽  
...  
1999 ◽  
Vol 574 ◽  
Author(s):  
D. Kumar ◽  
K. G. Cho ◽  
Zhang Chen ◽  
V. Craciun ◽  
P. H. Holloway ◽  
...  

AbstractThe growth, structural and cathodoluminescent (CL) properties of europium activated yttrium oxide (Eu:Y2O3) thin films are reported. The Eu:Y2O3 films were grown in-situ using a pulsed laser deposition technique. Our results show that Eu:Y2O3 films can grow epitaxially on (100) LaAlO3 substrates under optimized deposition parameters. The epitaxial growth of Eu:Y2O3 films on LaAlO3, which has a lattice mismatch of ∼ 60 %, is explained by matching of the atom positions in the lattices of the film and the substrate after a rotation. CL data from these films are consistent with highly crystalline Eu:Y2O3 films with an intense CL emission at 611 nm.


2021 ◽  
Vol 130 (8) ◽  
pp. 085301
Author(s):  
M. Novotný ◽  
P. Fitl ◽  
S. A. Irimiciuc ◽  
J. Bulíř ◽  
J. More-Chevalier ◽  
...  

1996 ◽  
pp. 721-725
Author(s):  
Alfons Ritzer ◽  
B. Falkner ◽  
S.T. Li ◽  
D. Bäuerle

2001 ◽  
Vol 79 (3) ◽  
pp. 394-396 ◽  
Author(s):  
Dave H. A. Blank ◽  
Hans Hilgenkamp ◽  
Alexander Brinkman ◽  
Dragana Mijatovic ◽  
Guus Rijnders ◽  
...  

2019 ◽  
Vol 3 (9) ◽  
pp. 55-63 ◽  
Author(s):  
Antonello Tebano ◽  
Carmela Aruta ◽  
Pier Gianni Medaglia ◽  
Giuseppe Balestrino ◽  
Norberto G. Boggio ◽  
...  

1997 ◽  
Vol 36 (Part 1, No. 7B) ◽  
pp. 4968-4970 ◽  
Author(s):  
Yukihiko Yamagata ◽  
Hiromitsu Kurogi ◽  
Keisuke Tsuchiya ◽  
Tomoaki Ikegami ◽  
Kenji Ebihara

2017 ◽  
Vol 11 (4) ◽  
pp. 043506
Author(s):  
John G. Jones ◽  
John J. Boeckl ◽  
Steven R. Smith ◽  
Gerald R. Landis ◽  
Neil R. Murphy ◽  
...  

1990 ◽  
Vol 191 ◽  
Author(s):  
J. S. Horwitz ◽  
D. B. Chrisey ◽  
M. S. Osofsky ◽  
K. S. Grabowski ◽  
T. A. Vanderah

ABSTRACTWe have deposited thin films of the electron-doped, high temperature superconductor Nd1.85Ce0.15CuO4−y by pulsed laser deposition. Films were deposited from a stoichiometric target using a KrF excimer laser (248 nm, 250 mJ/pulse, −2 J/cm2) as a function of substrate temperature, oxygen pressure and vacuum anneal conditions. The film composition and structure, as determined by RBS and XRD, were very sensitive to the deposition and subsequent anneal conditions. Stoichiometric films were deposited at low substrate temperatures (740 °C) but contained other orientations and phases. Predominantly c-axis oriented films were formed at high substrate temperatures (900 °C) and high background pressures of oxygen (200 mtorr). These films were semiconducting when quenched on oxygen or nitrogen following deposition. Slow cooling in a vacuum, yielded superconducting films with a maximum Tc-(onset) of 15 K and Tc(R=0) of 11 K. A variation of the deposition and anneal conditions indicated that loss of copper competed with the optimization of the carrier concentration.


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