Beam characterization measurement of a duoplasmatron ion source for the Nanjing Proton Source

Advantages of using a gasdynamic electron cyclotron ion source in a proton accelerator based compact neutron source DARIA are discussed. It is experimentally demonstrated that the gasdynamic proton source is able to provide ion beams with 100 mA current, duration from 100 microseconds and longer at repetition rate up to 1 kHz. Emittance of the ion beams produced by the gasdynamic ion source was measured using a “pepper-pot” method for two extraction electrodes geometries: “spherical” and flat parallel. It is shown that the normalized 4 rms emittance value for both electrode configurations in the range of extraction voltage from 41 t 48 kV does not exceed 2 mm mrad.

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The Hyperion-II radio-frequency oxygen ion source on the UCLA ims1290 ion microprobe: Beam characterization and applications in geochemistry and cosmochemistry

International Journal of Mass Spectrometry ◽

10.1016/j.ijms.2017.11.007 ◽

2018 ◽

Vol 424 ◽

pp. 1-9 ◽

Cited By ~ 19

Author(s):

Ming-Chang Liu ◽

Kevin D. McKeegan ◽

T. Mark Harrison ◽

George Jarzebinski ◽

Lvcian Vltava

Keyword(s):

Radio Frequency ◽

Ion Source ◽

Ion Microprobe ◽

Oxygen Ion ◽

Beam Characterization

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Nucleation and Early Growth of Sputtered thin Films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100069570 ◽

1970 ◽

Vol 28 ◽

pp. 516-517

Author(s):

Dudley M. Sherman ◽

Thos. E. Hutchinson

Keyword(s):

Thin Films ◽

Electron Beam ◽

Ion Beam ◽

Ion Source ◽

Water Cooling ◽

Stages Of Growth ◽

Lens Assembly ◽

Microscope Technique ◽

Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

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Aspects of high-resolution imaging with a scanning ion microprobe

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010014511x ◽

1986 ◽

Vol 44 ◽

pp. 750-751

Author(s):

R. Levi-Setti ◽

J. M. Chabala ◽

Y. L. Wang

Keyword(s):

Metal Ion ◽

Secondary Ion Mass Spectrometry ◽

Chromatic Aberration ◽

Ion Source ◽

Ion Microprobe ◽

Emission Pattern ◽

Intrinsic Resolution ◽

Resolution Imaging ◽

20 Nm ◽

Secondary Ion

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.

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