scholarly journals Novel high-energy ion implantation facility using a 15 MV Tandem Van de Graaff accelerator

Author(s):  
P. Thieberger ◽  
C. Carlson ◽  
D. Steski ◽  
R. Ghandi ◽  
A. Bolotnikov ◽  
...  
1982 ◽  
Vol 203 (1-3) ◽  
pp. 495-502 ◽  
Author(s):  
Robert K. Moniot ◽  
Theodore H. Kruse ◽  
William Savin ◽  
Gene S. Hall ◽  
Thomas Milazzo ◽  
...  

Author(s):  
K. F. Russell ◽  
L. L. Horton

Beams of heavy ions from particle accelerators are used to produce radiation damage in metal alloys. The damaged layer extends several microns below the surface of the specimen with the maximum damage and depth dependent upon the energy of the ions, type of ions, and target material. Using 4 MeV heavy ions from a Van de Graaff accelerator causes peak damage approximately 1 μm below the specimen surface. To study this area, it is necessary to remove a thickness of approximately 1 μm of damaged metal from the surface (referred to as “sectioning“) and to electropolish this region to electron transparency from the unirradiated surface (referred to as “backthinning“). We have developed electropolishing techniques to obtain electron transparent regions at any depth below the surface of a standard TEM disk. These techniques may be applied wherever TEM information is needed at a specific subsurface position.


2003 ◽  
Vol 22 (4) ◽  
pp. 225-237
Author(s):  
K. J. GRANT ◽  
ROBERTS A. ◽  
D. N. JAMIESON ◽  
B. ROUT ◽  
C. CHER

Author(s):  
Ueno Keiji ◽  
Matsumoto Yasuyo ◽  
Nishimiya Nobuyuki ◽  
Noshiro Mitsuru ◽  
Satou Mamoru
Keyword(s):  

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